| RE39895 |
Semiconductor integrated circuit arrangement fabrication method |
Takafumi Tokunaga, Tatsumi Mizutani, Kazutami Tago, Hideyuki Kazumi, Ken Yoshioka |
2007-10-23 |
| 6767782 |
Manufacturing method of semiconductor device |
Takeshi Saikawa, Ryohei Maeno, Tetsuo Saito, Tsuyoshi Tamaru, Kazutoshi Ohmori |
2004-07-27 |
| 6309980 |
Semiconductor integrated circuit arrangement fabrication method |
Takafumi Tokunaga, Tatsumi Mizutani, Kazutami Tago, Hideyuki Kazumi, Ken Yoshioka |
2001-10-30 |
| 6074958 |
Semiconductor integrated circuit arrangement fabrication method |
Takafumi Tokunaga, Tatsumi Mizutani, Kazutami Tago, Hideyuki Kazumi, Ken Yoshioka |
2000-06-13 |
| 5962347 |
Semiconductor integrated circuit arrangement fabrication method |
Takafumi Tokunaga, Tatsumi Mizutani, Kazutami Tago, Hideyuki Kazumi, Ken Yoshioka |
1999-10-05 |
| 5874013 |
Semiconductor integrated circuit arrangement fabrication method |
Takafumi Tokunaga, Tatsumi Mizutani, Kazutami Tago, Hideyuki Kazumi, Ken Yoshioka |
1999-02-23 |
| 5705029 |
Dry etching method |
Kazunori Tsujimoto, Shinichi Tachi |
1998-01-06 |
| 5643473 |
Dry etching method |
Shinichi Tachi, Kazunori Tsujimoto, Kiichiro Mukai |
1997-07-01 |
| 5580420 |
Plasma generating method and apparatus and plasma processing method and apparatus |
Katsuya Watanabe, Tetsunori Kaji, Naoyuki Tamura, Kenji Nakata, Hiroyuki Shichida +2 more |
1996-12-03 |
| 5354416 |
Dry etching method |
Kazunori Tsujimoto, Shinichi Tachi |
1994-10-11 |
| 5147500 |
Dry etching method |
Shinichi Tachi, Kazunori Tsujimoto, Kiichiro Mukai |
1992-09-15 |
| 5127987 |
Continuous etching process and apparatus therefor |
Hideo Komatsu, Osamu Matsumoto, Motoichi Kanazawa |
1992-07-07 |
| 4992136 |
Dry etching method |
Shinichi Tachi, Kazunori Tsujimoto |
1991-02-12 |
| 4986877 |
Method of dry etching |
Shinichi Tachi, Kazunori Tsujimoto |
1991-01-22 |
| 4985114 |
Dry etching by alternately etching and depositing |
Hiroshi Kawakami, Tokuo Kure, Kazunori Tsujimoto, Shinichi Tachi |
1991-01-15 |
| 4943344 |
Etching method |
Shinichi Tachi, Kazunori Tsujimoto, Kiichiro Mukai |
1990-07-24 |
| 4857137 |
Process for surface treatment |
Shinichi Tachi, Kazunori Tsujimoto, Kiichiro Mukai |
1989-08-15 |
| 4844767 |
Method of and apparatus for etching |
Shigeru Nishimatsi, Keizo Suzuki, Ken Ninomiya |
1989-07-04 |
| 4705595 |
Method for microwave plasma processing |
Shigeru Nishimatsu, Keizo Suzuki, Ken Ninomiya, Ryoji Hamazaki |
1987-11-10 |
| 4624214 |
Dry-processing apparatus |
Keizo Suzuki, Ken Ninomiya, Shigeru Nishimatsu |
1986-11-25 |
| 4609426 |
Method and apparatus for monitoring etching |
Yoshifumi Ogawa, Masaharu Nishiumi, Yoshie Tanaka, Shigeru Nishimatsu |
1986-09-02 |
| 4599135 |
Thin film deposition |
Sukeyoshi Tsunekawa, Yoshio Homma, Hiroshi Morisaki, Kiichiro Mukai |
1986-07-08 |
| 4579623 |
Method and apparatus for surface treatment by plasma |
Keizo Suzuki, Ken Ninomiya, Shigeru Nishimatsu, Osami Okada |
1986-04-01 |
| 4563240 |
Method and apparatus for plasma process |
Fumio Shibata, Katsuaki Nagatomo, Hidetomo Fukuhara, Gen Marumoto |
1986-01-07 |
| 4559100 |
Microwave plasma etching apparatus |
Ken Ninomiya, Shigeru Nishimatsu, Keizo Suzuki, Yoshifumi Ogawa |
1985-12-17 |