Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6747339 | Integrated circuit having reduced soft errors and reduced penetration of alkali impurities into the substrate | Atsushi Saiki, Seiki Harada | 2004-06-08 |
| 6551765 | Coating apparatus, discharge device, and coating method | Akira Sato, Katuyuki Soeda | 2003-04-22 |
| 5643473 | Dry etching method | Shinichi Tachi, Kazunori Tsujimoto, Sadayuki Okudaira | 1997-07-01 |
| 5391915 | Integrated circuit having reduced soft errors and reduced penetration of alkali impurities into the substrate | Atsushi Saiki, Seiki Harada | 1995-02-21 |
| 5292673 | Method of manufacturing a semiconductor device | Hiroshi Shinriki, Masayuki Nakata | 1994-03-08 |
| 5147500 | Dry etching method | Shinichi Tachi, Kazunori Tsujimoto, Sadayuki Okudaira | 1992-09-15 |
| 5079191 | Process for producing a semiconductor device | Hiroshi Shinriki, Yasushiro Nishioka, Noriyuki Sakuma | 1992-01-07 |
| 5013526 | Superconducting alloys comprising tungsten, molybdenum, silicon and oxygen | Nobuyoshi Kobayashi, Masayuki Suzuki, Seiichi Kondo, Makoto Matsui | 1991-05-07 |
| 4956043 | Dry etching apparatus | Masafumi Kanetomo, Shinichi Tachi, Kazunori Tsujimoto, Takahiro Daikoku, Shigekazu Kieda +2 more | 1990-09-11 |
| 4943344 | Etching method | Shinichi Tachi, Kazunori Tsujimoto, Sadayuki Okudaira | 1990-07-24 |
| 4937650 | Semiconductor capacitor device with dual dielectric | Hiroshi Shinriki, Yasushiro Nishioka, Noriyuki Sakuma | 1990-06-26 |
| 4926238 | Semiconductor device and method for producing the same | Atsushi Saiki, Seiki Harada | 1990-05-15 |
| 4897709 | Titanium nitride film in contact hole with large aspect ratio | Natsuki Yokoyama, Yoshio Homma, Kenji Hinode | 1990-01-30 |
| 4891684 | Semiconductor device | Yasushiro Nishioka, Hiroshi Shinriki, Noriyuki Sakuma | 1990-01-02 |
| 4857137 | Process for surface treatment | Shinichi Tachi, Sadayuki Okudaira, Kazunori Tsujimoto | 1989-08-15 |
| 4842891 | Method of forming a copper film by chemical vapor deposition | Hiroshi Miyazaki, Yoshio Homma | 1989-06-27 |
| 4809052 | Semiconductor memory device | Yasushiro Nishioka, Takeo Shiba, Hiroshi Shinriki, Akihisa Uchida, Ichiro Mitamura +4 more | 1989-02-28 |
| 4636833 | Semiconductor device | Yasushiro Nishioka, Noriyuki Homma, Noriyuki Sakuma | 1987-01-13 |
| 4599135 | Thin film deposition | Sukeyoshi Tsunekawa, Yoshio Homma, Hiroshi Morisaki, Sadayuki Okudaira | 1986-07-08 |
| 4570175 | Three-dimensional semiconductor device with thin film monocrystalline member contacting substrate at a plurality of locations | Masanobu Miyao, Makoto Ohkura, Iwao Takemoto, Terunori Warabisako, Ryo Haruta +3 more | 1986-02-11 |
| 4365264 | Semiconductor device with high density low temperature deposited Si.sub.w N.sub.x H.sub.y O.sub.z passivating layer | Seiki Harada, Shin-ichi Muramatsu, Atsushi Hiraiwa, Shigeru Takahashi, Katsuhisa Usami +3 more | 1982-12-21 |