Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9503018 | Semiconductor device | Toshiaki Tsutsumi, Yoshihiro Funato, Tomonori Okudaira, Tadato Yamagata, Takeshi Terasaki +2 more | 2016-11-22 |
| 9252793 | Semiconductor device | Toshiaki Tsutsumi, Yoshihiro Funato, Tomonori Okudaira, Tadato Yamagata, Takeshi Terasaki +2 more | 2016-02-02 |
| 7073147 | Method of manufacturing a semiconductor device | Hiroyuki Ikeda, Toshio Sasaki, Akinobu Watanabe, Toshio Yamada | 2006-07-04 |
| 5388073 | Semiconductor integrated circuit device and digital processor employing the same | Masami Usami, Yoshino Sakai, Masato Iwabuchi | 1995-02-07 |
| 5351211 | Semiconductor integrated circuit device having circuit inspection function | Keiichi Higeta, Sohei Omori, Yasuhiro Fujimura, Etsuko Iwamoto | 1994-09-27 |
| 5214302 | Semiconductor integrated circuit device forming on a common substrate MISFETs isolated by a field oxide and bipolar transistors isolated by a groove | Keiichi Higeta, Nobuo Tamba, Masanori Odaka, Katsumi Ogiue | 1993-05-25 |
| 5200348 | Method of manufacturing semiconductor device with constant width deep groove isolation | Daisuke Okada, Toshihiko Takakura, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura | 1993-04-06 |
| 5177584 | Semiconductor integrated circuit device having bipolar memory, and method of manufacturing the same | Yuji Yatsuda, Katsumi Ogiue, Kazuo Nakazato, Takahiro Onai | 1993-01-05 |
| 5141888 | Process of manufacturing semiconductor integrated circuit device having trench and field isolation regions | Mikinori Kawaji, Toshihiko Takakura, Shigeo Kuroda, Yoichi Tamaki, Takeo Shiba +2 more | 1992-08-25 |
| 5128740 | Semiconductor integrated circuit device with isolation grooves and protruding portions | Katsumi Ogiue, Toru Koizumi, Keiichi Higeta | 1992-07-07 |
| 5084402 | Method of fabricating a semiconductor substrate, and semiconductor device, having thick oxide films and groove isolation | Daisuke Okaka, Toshihiko Takakura, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura | 1992-01-28 |
| 5029127 | Bipolar SRAM having word lines as vertically stacked pairs of conductive lines parallelly formed with holding current lines | Ichiro Mitamura, Keiichi Higeta | 1991-07-02 |
| 5011788 | Process of manufacturing semiconductor integrated circuit device and product formed thereby | Mikinori Kawaji, Toshihiko Takakura, Shigeo Kuroda, Yoichi Tamaki, Takeo Shiba +2 more | 1991-04-30 |
| 4949162 | Semiconductor integrated circuit with dummy pedestals | Yoichi Tamaki, Kiyoji Ikeda, Toru Nakamura, Toru Koizumi, Hiromichi Enami +4 more | 1990-08-14 |
| 4926235 | Semiconductor device | Yoichi Tamaki, Tokuo Kure, Tohru Nakamura, Tetsuya Hayashida, Kiyoji Ikeda +3 more | 1990-05-15 |
| 4926378 | Bipolar static RAM having two wiring lines for each word line | Ichiro Mitamura, Keiichi Higeta | 1990-05-15 |
| 4907063 | Semiconductor body, and device formed therefrom, having grooves with silicon nitride on the groove surfaces | Daisuke Okada, Toshihiko Takakura, Shinji Nakashima, Nobuhiko Ohno, Katsumi Ogiue | 1990-03-06 |
| 4853343 | Method for fabricating a semiconductor integrated circuit device having thick oxide films and groove etch and refill | Daisuke Okada, Toshihiko Takakura, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura | 1989-08-01 |
| 4819054 | Semiconductor IC with dual groove isolation | Mikinori Kawaji, Toshihiko Takakura, Shigeo Kuroda, Yoichi Tamaki, Takeo Shiba +2 more | 1989-04-04 |
| 4809052 | Semiconductor memory device | Yasushiro Nishioka, Takeo Shiba, Hiroshi Shinriki, Kiichiro Mukai, Ichiro Mitamura +4 more | 1989-02-28 |
| 4746963 | Isolation regions formed by locos followed with groove etch and refill | Daisuke Okada, Toshihiko Takakura, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura | 1988-05-24 |
| 4700464 | Method of forming trench isolation in an integrated circuit | Daisuke Okada, Toshihiko Takakura, Shinji Nakashima, Nobuhiko Ohno, Katsumi Ogiue | 1987-10-20 |