HE

Hiromichi Enami

HI Hitachi: 25 patents #1,255 of 28,497Top 5%
HE Hitachi Vlsi Engineering: 11 patents #38 of 666Top 6%
HH Hitachi High-Technologies: 1 patents #1,282 of 1,917Top 70%
📍 Tachikawa, JP: #27 of 482 inventorsTop 6%
Overall (All Time): #156,041 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 1–25 of 26 patents

Patent #TitleCo-InventorsDate
7686917 Plasma processing system and apparatus and a sample processing method Toshio Masuda, Tatehito Usui, Mitsuru Suehiro, Hiroshi Kanekiyo, Hideyuki Yamamoto +1 more 2010-03-30
7526948 Device and method for detecting foreign material on the surface of plasma processing apparatus Hideyuki Yamamoto, Muneo Furuse 2009-05-05
7169254 Plasma processing system and apparatus and a sample processing method Toshio Masuda, Tatehito Usui, Mitsuru Suehiro, Hiroshi Kanekiyo, Hideyuki Yamamoto +1 more 2007-01-30
6923885 Plasma processing system and apparatus and a sample processing method Toshio Masuda, Tatehito Usui, Mitsuru Suehiro, Hiroshi Kanekiyo, Hideyuki Yamamoto +1 more 2005-08-02
6894334 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2005-05-17
6755932 Plasma processing system and apparatus and a sample processing method Toshio Masuda, Tatehito Usui, Mitsuru Suehiro, Hiroshi Kanekiyo, Hideyuki Yamamoto +1 more 2004-06-29
6754552 Control apparatus for plasma utilizing equipment Masaharu Nishiumi 2004-06-22
6548847 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING A FIRST WIRING STRIP EXPOSED THROUGH A CONNECTING HOLE, A TRANSITION-METAL FILM IN THE CONNECTING HOLE AND AN ALUMINUM WIRING STRIP THEREOVER, AND A TRANSITION-METAL NITRIDE FILM BETWEEN THE ALUMINUM WIRING STRIP AND THE TRANSITION-METAL FILM Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2003-04-15
6342412 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2002-01-29
6169324 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2001-01-02
6127255 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 2000-10-03
5917211 Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same Jun Murata, Yoshitaka Tadaki, Hiroko Kaneko, Toshihiro Sekiguchi, Hiroyuki Uchiyama +15 more 1999-06-29
5811316 Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1998-09-22
5780882 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1998-07-14
5739589 Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1998-04-14
5734188 Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same Jun Murata, Yoshitaka Tadaki, Hiroko Kaneko, Toshihiro Sekiguchi, Hiroyuki Uchiyama +15 more 1998-03-31
5646489 Plasma generator with mode restricting means Yutaka Kakehi, Yoshinao Kawasaki, Keizo Suzuki, Kazuo Nojiri, Tetsunori Kaji +2 more 1997-07-08
5557147 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1996-09-17
5543336 Removing damage caused by plasma etching and high energy implantation using hydrogen Kiyomi Katsuyama, Masanori Katsuyama 1996-08-06
5433789 Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves Yutaka Kakehi, Yoshinao Kawasaki, Keizo Suzuki, Kazuo Nojiri, Tetsunori Kaji +2 more 1995-07-18
5401356 Method and equipment for plasma processing Kiyomi Yagi, Masanori Katsuyama, Akihiko Konno 1995-03-28
5352324 Etching method and etching apparatus therefor Yasushi Gotoh, Tokuo Kure, Hiroshi Kawakami, Masanori Katsuyama, Kiyomi Yagi 1994-10-04
5331191 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1994-07-19
5264712 Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same Jun Murata, Yoshitaka Tadaki, Hiroko Kaneko, Toshihiro Sekiguchi, Hiroyuki Uchiyama +15 more 1993-11-23
5202275 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same Jun Sugiura, Osamu Tsuchiya, Makoto Ogasawara, Fumio Ootsuka, Kazuyoshi Torii +22 more 1993-04-13