Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5220169 | Surface analyzing method and apparatus | Ken Ninomiya, Keizo Suzuki | 1993-06-15 |
| 5140272 | Method of semiconductor surface measurment and an apparatus for realizing the same | Tatsumi Mizutani, Ryo Haruta, Kanji Tsujii, Chusuke Munakata, Shigeyuki Hosoki | 1992-08-18 |
| 5138158 | Surface analysis method and apparatus | Ken Ninomiya | 1992-08-11 |
| 5108543 | Method of surface treatment | Keizo Suzuki, Ken Ninomiya, Osami Okada | 1992-04-28 |
| 5108778 | Surface treatment method | Keizo Suzuki, Susumu Hiraoka, Tatsumi Mizutani | 1992-04-28 |
| 5028778 | Surface analysis method and a device therefor | Ken Ninomiya | 1991-07-02 |
| 4901667 | Surface treatment apparatus | Keizo Suzuki, Ken Ninomiya, Osami Okada | 1990-02-20 |
| 4886571 | Surface treatment and apparatus therefor | Keizo Suzuki, Susumu Hiraoka | 1989-12-12 |
| 4828874 | Laser surface treatment method and apparatus for practicing same | Susumu Hiraoka, Keizo Suzuki | 1989-05-09 |
| 4705595 | Method for microwave plasma processing | Sadayuki Okudaira, Keizo Suzuki, Ken Ninomiya, Ryoji Hamazaki | 1987-11-10 |
| 4624214 | Dry-processing apparatus | Keizo Suzuki, Ken Ninomiya, Sadayuki Okudaira | 1986-11-25 |
| 4609426 | Method and apparatus for monitoring etching | Yoshifumi Ogawa, Masaharu Nishiumi, Yoshie Tanaka, Sadayuki Okudaira | 1986-09-02 |
| 4579623 | Method and apparatus for surface treatment by plasma | Keizo Suzuki, Ken Ninomiya, Sadayuki Okudaira, Osami Okada | 1986-04-01 |
| 4559100 | Microwave plasma etching apparatus | Ken Ninomiya, Keizo Suzuki, Sadayuki Okudaira, Yoshifumi Ogawa | 1985-12-17 |
| 4522674 | Surface treatment apparatus | Ken Ninomiya, Keizo Suzuki | 1985-06-11 |
| 4481229 | Method for growing silicon-including film by employing plasma deposition | Keizo Suzuki, Atsushi Hiraiwa, Shigeru Takahashi, Ken Ninomiya, Sadayuki Okudaira | 1984-11-06 |
| 4462863 | Microwave plasma etching | Keizo Suzuki, Ken Ninomiya, Ichiro Kanomata, Sadayuki Okudaira, Hiroji Saida | 1984-07-31 |
| 4451841 | Semiconductor device with multi-layered electrodes | Ryoichi Hori, Masaharu Kubo, Norikazu Hashimoto, Kiyoo Itoh | 1984-05-29 |
| 4436581 | Uniform etching of silicon (doped and undoped) utilizing ions | Sadayuki Okudaira, Hiroji Saida, Yoshio Sakai, Keizo Suzuki | 1984-03-13 |
| 4433228 | Microwave plasma source | Keizo Suzuki, Noriyuki Sakudo, Ken Ninomiya, Hidemi Koike, Osami Okada +2 more | 1984-02-21 |
| 4430138 | Microwave plasma etching apparatus having fan-shaped discharge | Keizo Suzuki, Sadayuki Okudaira, Ichiro Kanomata | 1984-02-07 |
| 4361949 | Process for making a memory device | Ryoichi Hori, Masaharu Kubo, Norikazu Hashimoto, Kiyoo Itoh | 1982-12-07 |
| 4330384 | Process for plasma etching | Sadayuki Okudaira, Keizo Suzuki, Ichiro Kanomata | 1982-05-18 |
| 4298419 | Dry etching apparatus | Keizo Suzuki, Sadayuki Okudaira, Ichiro Kanomata | 1981-11-03 |
| 4270262 | Semiconductor device and process for making the same | Ryoichi Hori, Masaharu Kubo, Norikazu Hashimoto, Kiyoo Itoh | 1981-06-02 |