YT

Yushin Takasawa

HE Hitachi Kokusai Electric: 38 patents #3 of 843Top 1%
KE Kokusai Electric: 6 patents #98 of 583Top 20%
HI Hitachi: 1 patents #17,742 of 28,497Top 65%
📍 Toyama, JP: #45 of 1,699 inventorsTop 3%
Overall (All Time): #67,737 of 4,157,543Top 2%
44
Patents All Time

Issued Patents All Time

Showing 26–44 of 44 patents

Patent #TitleCo-InventorsDate
9217199 Substrate processing apparatus Yoshiro Hirose, Kenji Kanayama, Norikazu Mizuno, Yosuke Ota 2015-12-22
9196473 Method of manufacturing an oxynitride film for a semiconductor device Yosuke Ota, Yoshiro Hirose, Naonori Akae 2015-11-24
9136114 Method of manufacturing semiconductor device, substrate processing method, computer-readable medium with program for executing a substrate processing method, and substrate processing apparatus Ryota Sasajima, Yoshinobu Nakamura, Yoshiro Hirose 2015-09-15
9018104 Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus Yoshiro Hirose, Kenji Kanayama, Norikazu Mizuno, Yosuke Ota 2015-04-28
9011601 Substrate processing apparatus Naonori Akae, Yoshiro Hirose, Yosuke Ota 2015-04-21
8946092 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Yoshiro Hirose, Tsukasa Kamakura, Yoshinobu Nakamura, Ryota Sasajima 2015-02-03
8809204 Method of manufacturing semiconductor device and substrate processing apparatus Naonori Akae, Yoshiro Hirose, Yosuke Ota 2014-08-19
8679989 Method of manufacturing semiconductor device including removal of deposits from process chamber and supply portion Sadao Nakashima, Takahiro Maeda, Kiyohiko Maeda, Kenji Kameda 2014-03-25
8546272 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Yoshiro Hirose, Tsukasa Kamakura, Yoshinobu Nakamura, Ryota Sasajima 2013-10-01
8415258 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Naonori Akae, Yoshiro Hirose, Yosuke Ota, Ryota Sasajima 2013-04-09
8409988 Method of manufacturing semiconductor device and substrate processing apparatus Hajime Karasawa, Yoshiro Hirose 2013-04-02
8410001 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Yoshiro Hirose, Tsukasa Kamakura, Yukinao KAGA 2013-04-02
8410003 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Yosuke Ota, Yoshiro Hirose, Naonari Akae 2013-04-02
8367557 Method of forming an insulation film having low impurity concentrations Naonori Akae, Yoshiro Hirose, Yosuke Ota 2013-02-05
8202809 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Yosuke Ota, Naonori Akae, Yoshiro Hirose 2012-06-19
8076251 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Naonori Akae, Yoshiro Hirose, Yosuke Ota, Ryota Sasajima 2011-12-13
7884034 Method of manufacturing semiconductor device and substrate processing apparatus Yoshiro Hirose, Tomohide Kato, Nanori Akae 2011-02-08
6943089 Semiconductor device manufacturing method and semiconductor manufacturing apparatus Hajime Karasawa 2005-09-13
6821871 Method for manufacturing semiconductor device, substrate treatment method, and semiconductor manufacturing apparatus Hisashi Nomura, Hajime Karasawa, Yoshinori Imai, Tadanori Yoshida, Kenichi Yamaguchi 2004-11-23