MS

Masakazu Shimada

HE Hitachi Kokusai Electric: 14 patents #54 of 843Top 7%
KE Kokusai Electric: 7 patents #87 of 583Top 15%
OC Olympus Optical Co.: 4 patents #789 of 2,334Top 35%
TC Teitokusha Co.: 4 patents #2 of 9Top 25%
NC Nicca Chemical Co.: 1 patents #36 of 106Top 35%
📍 Toyama, JP: #111 of 1,699 inventorsTop 7%
Overall (All Time): #151,915 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 1–25 of 26 patents

Patent #TitleCo-InventorsDate
11970771 Vaporizer, substrate processing apparatus and method for manufacturing semiconductor device Atsushi Morikawa, Takeshi Kasai, Kenichi Suzaki, Hirohisa Yamazaki, Yoshimasa NAGATOMI 2024-04-30
11293096 Substrate processing apparatus, method for manufacturing semiconductor device and vaporizer Atsushi Morikawa, Takeshi Kasai, Kenichi Suzaki, Hirohisa Yamazaki, Yoshimasa NAGATOMI 2022-04-05
11031270 Substrate processing apparatus, substrate holder and mounting tool Atsushi Hirano, Yuji Takebayashi, Yukinao KAGA, Masanori Sakai 2021-06-08
10876207 Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device Noriyuki Isobe, Kenichi Suzaki, Takeshi Kasai, Yoshitaka Kawahara 2020-12-29
9437421 Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium Yuji Takebayashi, Atsushi Morikawa 2016-09-06
9184069 Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulator Akira Hayashida, Masaaki Ueno, Masashi Sugishita, Toshimitsu Miyata, Kimio Kitamura +2 more 2015-11-10
8876453 Substrate processing apparatus and method of manufacturing semiconductor device Yukinori Aburatani, Osamu Morita 2014-11-04
8507296 Substrate processing method and film forming method Masaaki Ueno, Takeo Hanashima, Haruo Morikawa, Akira Hayashida 2013-08-13
8501599 Substrate processing apparatus and substrate processing method Masaaki Ueno, Takeo Hanashima, Haruo Morikawa, Akira Hayashida 2013-08-06
8303712 Substrate processing apparatus, method for manufacturing semiconductor device, and process tube Seiyo Nakashima, Tomoyuki Yamada 2012-11-06
8158911 Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending member Akira Hayashida, Masaaki Ueno, Kimio Kitamura, Kenji Tanaka, Jyunichi Nishihara 2012-04-17
8148271 Substrate processing apparatus, coolant gas supply nozzle and semiconductor device manufacturing method Masaaki Ueno, Akira Hayashida, Takenori Oka 2012-04-03
8116618 Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices Akira Hayashida, Masaaki Ueno, Masashi Sugishita, Toshimitsu Miyata, Kimio Kitamura +2 more 2012-02-14
D652395 Semiconductor manufacturing equipment Takashi Nogami, Satoshi Aizawa, Seiyo Nakashima, Tomoyuki Yamada, Shinobu Sugiura +2 more 2012-01-17
D651990 Semiconductor manufacturing equipment Takashi Nogami, Satoshi Aizawa, Seiyo Nakashima, Tomoyuki Yamada, Shinobu Sugiura +2 more 2012-01-10
8030599 Substrate processing apparatus, heating device, and semiconductor device manufacturing method 2011-10-04
7863204 Substrate processing apparatus, heating apparatus for use in the same, method of manufacturing semiconductors with those apparatuses, and heating element supporting structure Toshimitsu Miyata, Akira Hayashida, Kimio Kitamura, Kenji Tanaka 2011-01-04
7700054 Substrate processing apparatus having gas side flow via gas inlet Akira Hayashida, Masaaki Ueno, Yukinori Aburatani, Tomoyuki Yamada, Seiyo Nakashima +1 more 2010-04-20
6563634 Microscope with aberration correcting function Yoshihiro Shimada, Hisao Kitagawa 2003-05-13
6043475 Focal point adjustment apparatus and method applied to microscopes Takashi Nagano, Takashi Yoneyama, Nobuyuki Nagasawa, Hideaki Endo, Jitsunari Kojima +2 more 2000-03-28
6034815 Laser scan microscope 2000-03-07
6025956 Incident-light fluorescence microscope Takashi Nagano, Keiji Shimizu, Kenji Kawasaki, Kiyonobu Kurata 2000-02-15
5879415 Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide 1999-03-09
5735961 Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide 1998-04-07
5516436 Agent for treating textile materials Juji Uchida, Takayoshi Kamano, Kuniaki Wakita, Masaaki Okawa 1996-05-14