Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12354868 | Cleaning method, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus | Yuma IKEDA, Kazuki NONOMURA | 2025-07-08 |
| 12354887 | Cleaning method, method of manufacturing semiconductor device, and substrate processing apparatus | Gen Li, Hirohisa Yamazaki, Yuji Takebayashi | 2025-07-08 |
| 12249502 | Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium | Kazuki NONOMURA, Yoshimasa NAGATOMI | 2025-03-11 |
| 12234550 | Vaporizer, processing apparatus and method of manufacturing semiconductor device | Gen Li, Hirohisa Yamazaki | 2025-02-25 |
| 11970771 | Vaporizer, substrate processing apparatus and method for manufacturing semiconductor device | Atsushi Morikawa, Masakazu Shimada, Takeshi Kasai, Hirohisa Yamazaki, Yoshimasa NAGATOMI | 2024-04-30 |
| 11929272 | Substrate processing apparatus, substrate support, and method of manufacturing semiconductor device | — | 2024-03-12 |
| 11873555 | Vaporizer, substrate processing apparatus and method of manufacturing semiconductor device | Gen Li, Hirohisa Yamazaki | 2024-01-16 |
| 11866822 | Vaporizer, substrate processing apparatus, and method of manufacturing semiconductor device | Hirohisa Yamazaki, Ryuichi Nakagawa, Yasunori EJIRI | 2024-01-09 |
| 11293096 | Substrate processing apparatus, method for manufacturing semiconductor device and vaporizer | Atsushi Morikawa, Masakazu Shimada, Takeshi Kasai, Hirohisa Yamazaki, Yoshimasa NAGATOMI | 2022-04-05 |
| 11020760 | Substrate processing apparatus and precursor gas nozzle | Toshiki Fujino, Yuma Fujii, Kazuki NONOMURA, Yoshinori Baba, Yuji Takebayashi | 2021-06-01 |
| 10876207 | Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device | Noriyuki Isobe, Takeshi Kasai, Yoshitaka Kawahara, Masakazu Shimada | 2020-12-29 |
| D828091 | Gas supply nozzle | Toshiki Fujino, Yuma Fujii, Kazuki NONOMURA, Yoshinori Baba, Yuji Takebayashi | 2018-09-11 |
| 9970112 | Substrate processing apparatus and method of manufacturing semiconductor device | Yasunobu Koshi, Akihito Yoshino | 2018-05-15 |
| 9708708 | Method of manufacturing semiconductor device | Noriyuki Isobe, Yuji Takebayashi, Takeshi Kasai, Atsushi Hirano, Koichi Oikawa | 2017-07-18 |
| 9390916 | Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium | Yoshiro Hirose | 2016-07-12 |
| 9093270 | Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium | Yoshiro Hirose | 2015-07-28 |
| 8999858 | Substrate processing apparatus and method of manufacturing semiconductor device | Yasunobu Koshi, Akihito Yoshino | 2015-04-07 |
| 8636882 | Producing method of semiconductor device and substrate processing apparatus | Jie Wang | 2014-01-28 |
| 8231731 | Substrate processing apparatus | Jie Wang | 2012-07-31 |
| 8227030 | Method of manufacturing semiconductor device and apparatus for processing substrate | Takaaki Noda | 2012-07-24 |
| 8221835 | Method of manufacturing semiconductor device and apparatus for processing substrate | Takaaki Noda | 2012-07-17 |
| 8211798 | Substrate treating apparatus and method for manufacturing semiconductor device | Takashi Ozaki | 2012-07-03 |
| 7955991 | Producing method of a semiconductor device using CVD processing | Jie Wang | 2011-06-07 |
| 7915165 | Substrate treating apparatus and method for manufacturing semiconductor device | Takashi Ozaki | 2011-03-29 |
| 7737034 | Substrate treating apparatus and method for manufacturing semiconductor device | Takashi Ozaki | 2010-06-15 |