SK

Seiichiro Kanno

HH Hitachi High-Technologies: 32 patents #66 of 1,917Top 4%
HI Hitachi: 11 patents #3,813 of 28,497Top 15%
Overall (All Time): #68,871 of 4,157,543Top 2%
43
Patents All Time

Issued Patents All Time

Showing 26–43 of 43 patents

Patent #TitleCo-InventorsDate
7396771 Plasma etching apparatus and plasma etching method Go Miya, Naoshi Itabashi, Motohiko Yoshigai, Junichi Tanaka, Masahito Mori +2 more 2008-07-08
7183715 Method for operating a semiconductor processing apparatus Ryoji Nishio, Ken Yoshioka, Saburou Kanai, Hideki Kihara, Hideyuki Yamamoto 2007-02-27
7138606 Wafer processing method Ken Yoshioka, Ryoji Nishio, Saburou Kanai, Hideki Kihara, Koji Okuda 2006-11-21
6895179 Wafer stage for wafer processing apparatus Ken Yoshioka, Ryoji Nishio, Saburou Kanai, Hideki Kihara, Koji Okuda 2005-05-17
6825617 Semiconductor processing apparatus Ryoji Nishio, Ken Yoshioka, Saburou Kanai, Hideki Kihara, Hideyuki Yamamoto 2004-11-30
6771481 Plasma processing apparatus for processing semiconductor wafer using plasma Ryoji Nishio, Hideyuki Yamamoto, Akira Kagoshima 2004-08-03
6747239 Plasma processing apparatus and method Junichi Tanaka, Hiroyuki Kitsunai, Ryoji Nishio, Hideyuki Yamamoto 2004-06-08
6716301 Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe Ryoji Nishio, Tsutomu Tetsuka, Junichi Tanaka, Hideyuki Yamamoto, Kazuyuki Ikenaga +1 more 2004-04-06
6677167 Wafer processing apparatus and a wafer stage and a wafer processing method Hironobu Kawahara, Mitsuru Suehiro, Saburou Kanai, Toshio Masuda 2004-01-13
6646233 Wafer stage for wafer processing apparatus and wafer processing method Ken Yoshioka, Ryoji Nishio, Saburou Kanai, Hideki Kihara, Koji Okuda 2003-11-11
6590179 Plasma processing apparatus and method Junichi Tanaka, Hiroyuki Kitsunai, Ryoji Nishio, Hideyuki Yamamoto 2003-07-08
6583979 Electrostatically attracting electrode and a method of manufacture thereof Kazue Takahasi, Youichi Itou, Saburo Kanai 2003-06-24
6549393 Semiconductor wafer processing apparatus and method Hironobu Kawahara, Mitsuru Suehiro, Saburo Kanai, Ken Yoshioka 2003-04-15
6373681 Electrostatic chuck, and method of and apparatus for processing sample using the chuck Tatehito Usui, Ken Yoshioka, Saburo Kanai, Youichi Itou 2002-04-16
6370007 Electrostatic chuck Kazue Takahasi, Youichi Itou, Saburo Kanai 2002-04-09
6243251 Electrostatic chuck, and method of and apparatus for processing sample using the chuck Tatehito Usui, Ken Yoshioka, Saburo Kanai, Youichi Itou 2001-06-05
5946184 Electrostatic chuck, and method of and apparatus for processing sample Tatehito Usui, Ken Yoshioka, Saburo Kanai, Youichi Itou 1999-08-31
5781400 Electrostatically attracting electrode and a method of manufacture thereof Kazue Takahashi, Youichi Itou, Saburo Kanai 1998-07-14