Issued Patents All Time
Showing 26–50 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9877326 | Measuring device and a measuring method for determining an active channel | — | 2018-01-23 |
| 9819330 | Filter for interpolated signals | — | 2017-11-14 |
| 9719587 | Hydraulic axle | Gottfried Hendrix | 2017-08-01 |
| 9667356 | Signal generating device with integrated fading generating unit and signal generating method | — | 2017-05-30 |
| 9632436 | Optical assembly with suppression of degradation | Dirk Heinrich Ehm, Markus Walter | 2017-04-25 |
| 9627778 | Antenna element with high gain toward the horizon | Gerard James Hayes | 2017-04-18 |
| 9535210 | Optical hollow waveguide assembly | Markus Deguenther, Vladimir Davydenko | 2017-01-03 |
| 9354529 | Arrangement for use in a projection exposure tool for microlithography having a reflective optical element | Dirk Heinrich Ehm, Maarten Van Kampen, Vadim Yevgenyevich Banine, Erik Roelof Loopstra | 2016-05-31 |
| 9294324 | Signal generator and signal generation method with cyclic prefix generation | — | 2016-03-22 |
| 9293830 | Antenna element with high gain toward the horizon | Gerard James Hayes | 2016-03-22 |
| 9182549 | Optical coupling system for two optical waveguides | Clemens Wurster, Gregor Langer, Hannes Stahr | 2015-11-10 |
| 9046794 | Cleaning module, EUV lithography device and method for the cleaning thereof | Stefan Hembacher, Dieter Kraus, Dirk Heinrich Ehm, Stefan Koehler, Almut Czap +2 more | 2015-06-02 |
| 9041905 | Optical arrangement, in particular in a projection exposure apparatus for EUV lithography | Dirk Heinrich Ehm, Guenther Dengel | 2015-05-26 |
| 8953145 | Detection of contaminating substances in an EUV lithography apparatus | Dieter Kraus, Dirk Heinrich Ehm | 2015-02-10 |
| 8885141 | EUV lithography device and method for processing an optical element | Wolfgang Singer, Yim-Bun Patrick Kwan, Dirk Heinrich Ehm, Dieter Kraus, Stefan Wiesner +3 more | 2014-11-11 |
| 8339576 | Projection objective of a microlithographic projection exposure apparatus | Ulrich Loering, Vladimir Kamenov, Dirk Heinrich Ehm, Moritz Becker, Andreas Wurmbrand | 2012-12-25 |
| 8288064 | Method for examining a wafer with regard to a contamination limit and EUV projection exposure system | Andreas Dorsel | 2012-10-16 |
| 8053746 | Irradiation device | Jan Timmer, Holger Goebel, Juergen Heese, Michael Schillo | 2011-11-08 |
| 8054446 | EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface | Dieter Kraus, Dirk Heinrich Ehm | 2011-11-08 |
| 7955767 | Method for examining a wafer with regard to a contamination limit and EUV projection exposure system | Andreas Dorsel | 2011-06-07 |
| 7911598 | Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device | Dieter Kraus, Dirk Heinrich Ehm, Thomas Stein, Harald Woelfle | 2011-03-22 |
| 7881828 | Bus module for connecting electrically triggered fluidic valves | — | 2011-02-01 |
| 7812944 | Array for optical evaluation of an object array | — | 2010-10-12 |
| D617960 | Laundry appliance | Andreas Böhm, Klaus Forsterling, Kemal Genc, Johannes Geyer | 2010-06-15 |
| 7698887 | Method and apparatus for determining local emissions loading of emissions trap | Helmut Venghaus, Lee Watts, Andreas Mayr, Clive D. Telford, Marco Ranalli +4 more | 2010-04-20 |