Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8642468 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Seshadri Ganguli, Srinivas Gandikota, Yu Lei, Xinliang Lu, Sang Ho Yu +4 more | 2014-02-04 |
| 8375892 | Methods and apparatus for incorporating nitrogen in oxide films | Tatsuya Sato, Fanos Christodoulou | 2013-02-19 |
| 7913645 | Methods and apparatus for incorporating nitrogen in oxide films | Tatsuya Sato, Fanos Christodoulou | 2011-03-29 |
| 7902050 | Methods and apparatus for incorporating nitrogen in oxide films | Tatsuya Sato, Fanos Christodoulou | 2011-03-08 |
| 7837838 | Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus | Thai Cheng Chua, Alex Paterson, Steven C. H. Hung, Tatsuya Sato, Valentin N. Todorow +1 more | 2010-11-23 |
| 7678710 | Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system | Thai Cheng Chua, Steven C. H. Hung, Tatsuya Sato, Alex Paterson, Valentin Todorov +1 more | 2010-03-16 |
| 7645710 | Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system | Christopher S. Olsen, Thai Cheng Chua, Steven C. H. Hung, Tatsuya Sato, Alex Paterson +2 more | 2010-01-12 |
| 6454860 | Deposition reactor having vaporizing, mixing and cleaning capabilities | Craig Metzner, Turgut Sahin, Gregory Redinbo, Pravin K. Narwankar | 2002-09-24 |
| 6328808 | Apparatus and method for aligning and controlling edge deposition on a substrate | Kenneth Tsai, Joseph Yudovsky, Steve Ghanayem, Ken Kaung Lai, Toshiyuki Nakagawa +1 more | 2001-12-11 |
| 6274058 | Remote plasma cleaning method for processing chambers | Ravi Rajagopalan, Pravin K. Narwankar, Huyen Tran, Padmanabhan Krishnaraj, Alan Ablao +1 more | 2001-08-14 |
| 6218300 | Method and apparatus for forming a titanium doped tantalum pentaoxide dielectric layer using CVD | Pravin K. Narwankar, Turgut Sahin, Randall S. Urdahl, Ankineedu Velaga | 2001-04-17 |
| 6204203 | Post deposition treatment of dielectric films for interface control | Pravin K. Narwankar, Turgut Sahin, Gregory Redinbo, Huyen Tran | 2001-03-20 |
| 6186092 | Apparatus and method for aligning and controlling edge deposition on a substrate | Kenneth Tsai, Joseph Yudovsky, Steve Ghanayem, Ken Kaung Lai, Toshiyuki Nakagawa +1 more | 2001-02-13 |