Issued Patents All Time
Showing 126–150 of 176 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7406394 | Spectra based endpointing for chemical mechanical polishing | Dominic J. Benvegnu, Jeffrey Drue David | 2008-07-29 |
| 7374477 | Polishing pads useful for endpoint detection in chemical mechanical polishing | Manoocher Birang | 2008-05-20 |
| 7354334 | Reducing polishing pad deformation | Manoocher Birang, Doyle E. Bennett | 2008-04-08 |
| 7294039 | Polishing system with in-line and in-situ metrology | Bret W. Adams, Sanjay Rajaram, David A. Chan, Manoocher Birang | 2007-11-13 |
| 7247080 | Feedback controlled polishing processes | Doyle E. Bennett, Arulkumar Shanmugasundram | 2007-07-24 |
| 7229340 | Monitoring a metal layer during chemical mechanical polishing | Hiroji Hanawa, Nils Johansson, Manoocher Birang | 2007-06-12 |
| 7195536 | Integrated endpoint detection system with optical and eddy current monitoring | Manoocher Birang, Nils Johansson | 2007-03-27 |
| 7195535 | Metrology for chemical mechanical polishing | Dominic J. Benvegnu | 2007-03-27 |
| 7153185 | Substrate edge detection | Manoocher Birang, Jeffrey Drue David | 2006-12-26 |
| 7118457 | Method of forming a polishing pad for endpoint detection | Manoocher Birang | 2006-10-10 |
| 7112960 | Eddy current system for in-situ profile measurement | G. Laurie Miller, Manoocher Birang | 2006-09-26 |
| 7101251 | Polishing system with in-line and in-situ metrology | Bret W. Adams, Sanjay Rajaram, David A. Chan, Manoocher Birang | 2006-09-05 |
| 7101254 | System and method for in-line metal profile measurement | Nils Johansson, Andreas Norbert Wiswesser, Manoocher Birang | 2006-09-05 |
| 7097537 | Determination of position of sensor measurements during polishing | Jeffrey Drue David, Nils Johansson, Manoocher Birang, Ingemar Carlsson | 2006-08-29 |
| 7074109 | Chemical mechanical polishing control system and method | Doyle E. Bennett, Jeffrey Drue David, Manoocher Birang, Jimin Zhang | 2006-07-11 |
| 7024268 | Feedback controlled polishing processes | Doyle E. Bennett, Arulkumar Shanmugasundram | 2006-04-04 |
| 7018271 | Method for monitoring a substrate during chemical mechanical polishing | Andreas Norbert Wiswesser, Walter Schoenleber | 2006-03-28 |
| 7016795 | Signal improvement in eddy current sensing | Manoocher Birang | 2006-03-21 |
| 7008295 | Substrate monitoring during chemical mechanical polishing | Andreas Norbert Wiswesser, Manoocher Birang | 2006-03-07 |
| 7008297 | Combined eddy current sensing and optical monitoring for chemical mechanical polishing | Nils Johansson, Manoocher Birang | 2006-03-07 |
| 7008296 | Data processing for monitoring chemical mechanical polishing | Nils Johansson, Manoocher Birang | 2006-03-07 |
| 7001242 | Method and apparatus of eddy current monitoring for chemical mechanical polishing | Manoocher Birang, Hyeong Cheol Kim | 2006-02-21 |
| 7001246 | Method and apparatus for monitoring a metal layer during chemical mechanical polishing | Hiroji Hanawa, Nils Johansson, Manoocher Birang | 2006-02-21 |
| 6991516 | Chemical mechanical polishing with multi-stage monitoring of metal clearing | Jeffrey Drue David, Dirk De Roover, Jimin Zhang, Doyle E. Bennett, Manoocher Birang | 2006-01-31 |
| 6986699 | Method and apparatus for determining polishing endpoint with multiple light sources | Andreas Norbert Wiswesser, Walter Schoenleber, Manoocher Birang | 2006-01-17 |