Issued Patents All Time
Showing 151–175 of 176 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6975107 | Eddy current sensing of metal removal for chemical mechanical polishing | Hiroji Hanawa, Nils Johansson, Manoocher Birang | 2005-12-13 |
| 6966816 | Integrated endpoint detection system with optical and eddy current monitoring | Manoocher Birang, Nils Johansson | 2005-11-22 |
| 6945845 | Chemical mechanical polishing apparatus with non-conductive elements | Doyle E. Bennett, Sandeep Rammohan Koppikar, Jeffrey Drue David, Nils Johansson | 2005-09-20 |
| 6939198 | Polishing system with in-line and in-situ metrology | Bret W. Adams, Sanjay Rajaram, David A. Chan, Manoocher Birang | 2005-09-06 |
| 6930478 | Method for monitoring a metal layer during chemical mechanical polishing using a phase difference signal | Hiroji Hanawa, Nils Johansson, Manoocher Birang | 2005-08-16 |
| 6924641 | Method and apparatus for monitoring a metal layer during chemical mechanical polishing | Hiroji Hanawa, Nils Johansson, Manoocher Birang | 2005-08-02 |
| 6913511 | Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers | Andreas Norbert Wiswesser, Judon Tony Pan | 2005-07-05 |
| 6878038 | Combined eddy current sensing and optical monitoring for chemical mechanical polishing | Nils Johansson, Manoocher Birang | 2005-04-12 |
| 6832950 | Polishing pad with window | Jason Wright, Andreas Norbert Wiswesser | 2004-12-21 |
| 6811466 | System and method for in-line metal profile measurement | Nils Johansson, Andreas Norbert Wiswesser, Manoocher Birang | 2004-11-02 |
| 6764380 | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing | Andreas Norbert Wiswesser, Walter Schoenleber | 2004-07-20 |
| 6716085 | Polishing pad with transparent window | Andreas Norbert Wiswesser | 2004-04-06 |
| 6657726 | In situ measurement of slurry distribution | Yuchun Wang | 2003-12-02 |
| 6652355 | Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers | Andreas Norbert Wiswesser, Judon Tony Pan | 2003-11-25 |
| 6632124 | Optical monitoring in a two-step chemical mechanical polishing process | Bret W. Adams, Rajeev Bajaj, Savitha Nanjangud, Andreas Norbert Wiswesser, Stan Tsai +3 more | 2003-10-14 |
| 6607422 | Endpoint detection with light beams of different wavelengths | Andreas Norbert Wiswesser | 2003-08-19 |
| 6524165 | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing | Andreas Norbert Wiswesser, Walter Schoenleber | 2003-02-25 |
| 6506097 | Optical monitoring in a two-step chemical mechanical polishing process | Bret W. Adams, Rajeev Bajaj, Savitha Nanjangud, Andreas Norbert Wiswesser, Stan Tsai +3 more | 2003-01-14 |
| 6494766 | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing | Andreas Norbert Wiswesser, Wallter Waiter Schoenleber | 2002-12-17 |
| 6399501 | Method and apparatus for detecting polishing endpoint with optical monitoring | Manoocher Birang, Nils Johansson | 2002-06-04 |
| 6383058 | Adaptive endpoint detection for chemical mechanical polishing | Manoocher Birang | 2002-05-07 |
| 6296548 | Method and apparatus for optical monitoring in chemical mechanical polishing | Andreas Norbert Wiswesser, Judon Tony Pan, Manoocher Birang | 2001-10-02 |
| 6280289 | Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers | Andreas Norbert Wiswesser, Judon Tony Pan | 2001-08-28 |
| 6247998 | Method and apparatus for determining substrate layer thickness during chemical mechanical polishing | Andreas Norbert Wiswesser, Walter Schoenleber, Manoocher Birang | 2001-06-19 |
| 6190234 | Endpoint detection with light beams of different wavelengths | Andreas Norbert Wiswesser | 2001-02-20 |