Issued Patents All Time
Showing 51–75 of 95 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8268665 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more | 2012-09-18 |
| 8241704 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Chongying Xu, Thomas H. Baum | 2012-08-14 |
| 8236097 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Jeffrey F. Roeder | 2012-08-07 |
| 8153833 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Jeffrey F. Roeder | 2012-04-10 |
| 8034407 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Chongying Xu, Thomas H. Baum | 2011-10-11 |
| 8008117 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +4 more | 2011-08-30 |
| 7964746 | Copper precursors for CVD/ALD/digital CVD of copper metal films | Tianniu Chen, Chongying Xu, Thomas H. Baum, Jeffrey F. Roeder, Juan E. Dominguez +2 more | 2011-06-21 |
| 7910765 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Jeffrey F. Roeder | 2011-03-22 |
| 7887883 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Jeffrey F. Roeder | 2011-02-15 |
| 7858525 | Fluorine-free precursors and methods for the deposition of conformal conductive films for nanointerconnect seed and fill | Juan E. Dominguez, Adrien LaVoie, John J. Plombon, Joseph H. Han, Harsono S. Simka +1 more | 2010-12-28 |
| 7838329 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +4 more | 2010-11-23 |
| 7786320 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Jeffrey F. Roeder | 2010-08-31 |
| 7781605 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Jeffrey F. Roeder, Tianniu Chen, Thomas H. Baum | 2010-08-24 |
| 7713346 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Jeffrey F. Roeder | 2010-05-11 |
| 7601860 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Jeffrey F. Roeder, Tianniu Chen, Thomas H. Baum | 2009-10-13 |
| 7531679 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Thomas H. Baum, Jeffrey F. Roeder | 2009-05-12 |
| 7446217 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Thomas H. Baum, Jeffrey F. Roeder | 2008-11-04 |
| 7370511 | Gas sensor with attenuated drift characteristic | Ing-Shin Chen, Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch | 2008-05-13 |
| 7285308 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Chongying Xu, Thomas H. Baum | 2007-10-23 |
| 7208427 | Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing | Jeffrey F. Roeder, Chongying Xu, Thomas H. Baum | 2007-04-24 |
| 7094284 | Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same | Thomas H. Baum, Jeffrey F. Roeder, Chongying Xu | 2006-08-22 |
| 7005392 | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same | Thomas H. Baum, Chongying Xu, Jeffrey F. Roeder | 2006-02-28 |
| 7005303 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder +2 more | 2006-02-28 |
| 6900498 | Barrier structures for integration of high K oxides with Cu and Al electrodes | Gregory T. Stauf, Jeffrey F. Roeder, Ing-Shin Chen | 2005-05-31 |
| 6869638 | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same | Thomas H. Baum, Chongying Xu, Jeffrey F. Roeder | 2005-03-22 |