Issued Patents All Time
Showing 26–50 of 95 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11371138 | Chemical vapor deposition processes using ruthenium precursor and reducing gas | Philip S. H. Chen, Thomas H. Baum | 2022-06-28 |
| 11107675 | CVD Mo deposition by using MoOCl4 | Thomas H. Baum, Philip S. H. Chen, Robert Wright, Jr., Shuang Meng, Richard Assion | 2021-08-31 |
| 10895010 | Solid precursor-based delivery of fluid utilizing controlled solids morphology | John M. Cleary, Jose I. Arno, Donn K. Naito, Scott L. Battle, John N. Gregg +2 more | 2021-01-19 |
| 10895347 | Heat transfer to ampoule trays | Scott L. Battle, John N. Gregg | 2021-01-19 |
| 10872770 | Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt | Sangbum Han, Seobong Chang, Jaeeon Park, Thomas H. Baum | 2020-12-22 |
| 10793947 | Alloys of Co to reduce stress | Philip S. H. Chen, Thomas H. Baum | 2020-10-06 |
| 10475575 | In-situ oxidized NiO as electrode surface for high k MIM device | Weimin Li, James A. O'Neill | 2019-11-12 |
| 10453744 | Low temperature molybdenum film deposition utilizing boron nucleation layers | Shuang Meng, Richard Assion, Thomas H. Baum | 2019-10-22 |
| 10392700 | Solid vaporizer | Thomas H. Baum, Robert Wright, Jr., Scott L. Battle, John M. Cleary | 2019-08-27 |
| 10385452 | Source reagent-based delivery of fluid with high material flux for batch deposition | John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary +2 more | 2019-08-20 |
| 10186570 | ALD processes for low leakage current and low equivalent oxide thickness BiTaO films | Philip S. H. Chen, Weimin Li, Woosung Jang, Dingkai Guo | 2019-01-22 |
| 10043658 | Precursors for silicon dioxide gap fill | William Hunks, Chongying Xu, Jeffrey F. Roeder, Steven M. Bilodeau, Weimin Li | 2018-08-07 |
| 10002772 | Vapor phase etching of hafnia and zirconia | — | 2018-06-19 |
| 9783558 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Jeffrey F. Roeder, Tianniu Chen, Thomas H. Baum | 2017-10-10 |
| 9443736 | Silylene compositions and methods of use thereof | Thomas M. Cameron, Susan DiMeo, Weimin Li | 2016-09-13 |
| 9337054 | Precursors for silicon dioxide gap fill | William Hunks, Chongying Xu, Jeffrey F. Roeder, Steven M. Bilodeau, Weimin Li | 2016-05-10 |
| 9219232 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more | 2015-12-22 |
| 9102693 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Jeffrey F. Roeder, Tianniu Chen, Thomas H. Baum | 2015-08-11 |
| 8877549 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Gregory T. Stauf, Chongying Xu, William Hunks +2 more | 2014-11-04 |
| 8821640 | Solid precursor-based delivery of fluid utilizing controlled solids morphology | John M. Cleary, Jose I. Arno, Donn K. Naito, Scott L. Battle, John N. Gregg +2 more | 2014-09-02 |
| 8802882 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Jeffrey F. Roeder, Tianniu Chen, Thomas H. Baum | 2014-08-12 |
| 8709863 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more | 2014-04-29 |
| 8679894 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Gregory T. Stauf, Chongying Xu, William Hunks +2 more | 2014-03-25 |
| 8524931 | Precursor compositions for ALD/CVD of group II ruthenate thin films | Chongying Xu, Thomas M. Cameron, Jeffrey F. Roeder, Matthias Stender, Tianniu Chen | 2013-09-03 |
| 8288198 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Gregory T. Stauf, Chongying Xu, William Hunks +2 more | 2012-10-16 |