Issued Patents 2024
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12183604 | Integrated dry processes for patterning radiation photoresist patterning | Jengyi Yu, Mohammed Haroon Alvi, Richard Wise, Yang Pan, Richard A. Gottscho +5 more | 2024-12-31 |
| 12183589 | Tin oxide mandrels in patterning | Jengyi Yu, Seongjun Heo, Boris Volosskiy, Sivananda K. Kanakasabapathy, Richard Wise +2 more | 2024-12-31 |
| 12119243 | Plasma etching chemistries of high aspect ratio features in dielectrics | Keren Jacobs Kanarik, Yang Pan, Jeffrey Marks | 2024-10-15 |
| 12105422 | Photoresist development with halide chemistries | Jengyi Yu, Da Li, Yiwen FAN, Yang Pan, Jeffrey Marks +5 more | 2024-10-01 |
| 12094711 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2024-09-17 |
| 12080562 | Atomic layer etch and ion beam etch patterning | Tamal Mukherjee, Wenbing Yang, Girish Dixit, Yang Pan | 2024-09-03 |
| 12062537 | High etch selectivity, low stress ashable carbon hard mask | Jun Xue, Mary Anne Manumpil, Shih-Ked Lee | 2024-08-13 |
| 12037686 | Selective carbon deposition | Awnish Gupta, Adrien LaVoie, Bart J. van Schravendijk | 2024-07-16 |
| 12027375 | Selective etch using a sacrificial mask | Daniel Peter, Da Li, Jengyi Yu, Alexander Kabansky, Katie Lynn Nardi +1 more | 2024-07-02 |
| 11935758 | Atomic layer etching for subtractive metal etch | Wenbing Yang, Mohand Brouri, Shih-Ked Lee, Yiwen FAN, Wook Choi +3 more | 2024-03-19 |