Issued Patents 2024
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12125705 | Method for providing doped silicon using a diffusion barrier layer | Purushottam Kumar, Gengwei Jiang, Tengfei Miao, Joseph R. Abel, Adrien LaVoie | 2024-10-22 |
| 12112980 | Method to create air gaps | Patrick A. Van Cleemput, Seshasayee Varadarajan | 2024-10-08 |
| 12087572 | Etch stop layer | Soumana Hamma, Kai-Lin Ou, Ming Li, Malay Milan Samantaray | 2024-09-10 |
| 12087574 | Oxidative conversion in atomic layer deposition processes | Douglas Walter Agnew, Joseph R. Abel | 2024-09-10 |
| 12087573 | Modulation of oxidation profile for substrate processing | Gerald Joseph Brady, Kevin McLaughlin, Pratik Sankhe, Shriram Vasant Bapat | 2024-09-10 |
| 12080592 | Film stack simplification for high aspect ratio patterning and vertical scaling | Hui-Jung Wu, Mark Kawaguchi, Gereng Gunawan, Jay E. Uglow, Nagraj Shankar +11 more | 2024-09-03 |
| 12051589 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Richard Wise, Arpan Mahorowala, Patrick A. Van Cleemput | 2024-07-30 |
| 12049699 | Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching | Joseph R. Abel, Purushottam Kumar, Adrien LaVoie | 2024-07-30 |
| 12040181 | Modulated atomic layer deposition | Chan Myae Myae Soe, Chloe Baldasseroni, Shiva Sharan Bhandari, Pulkit Agarwal, Adrien LaVoie | 2024-07-16 |
| 12037686 | Selective carbon deposition | Awnish Gupta, Adrien LaVoie, Samantha Tan | 2024-07-16 |
| 11920239 | Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma | Bhadri N. Varadarajan, Bo Gong, Rachel E. Batzer, Huatan Qiu, Geoffrey Hohn | 2024-03-05 |