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Tin oxide mandrels in patterning |
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| 12183604 |
Integrated dry processes for patterning radiation photoresist patterning |
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| 12127486 |
Resistive random access memory with preformed filaments |
Hyungsuk Alexander Yoon, Thorsten Lill |
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| 12119243 |
Plasma etching chemistries of high aspect ratio features in dielectrics |
Keren Jacobs Kanarik, Samantha Tan, Jeffrey Marks |
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| 12119218 |
Sacrificial protection layer for environmentally sensitive surfaces of substrates |
Stephen M. Sirard, Ratchana Limary, Diane Hymes |
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| 12105422 |
Photoresist development with halide chemistries |
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| 12094711 |
Tin oxide films in semiconductor device manufacturing |
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| 12080562 |
Atomic layer etch and ion beam etch patterning |
Samantha Tan, Tamal Mukherjee, Wenbing Yang, Girish Dixit |
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| 12062538 |
Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement |
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| 12022202 |
Image sensor, global shutter control method and computer storage medium |
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| 11969697 |
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| 11951446 |
Acryloyloxy-terminated polydimethylsiloxane (AC-PDMS)-based thin-film composite (TFC) membrane, and preparation method and use thereof |
Gongping Liu, Wanqin Jin |
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| 11944942 |
Polyether block polyamide/polydimethylsiloxane composite membrane for gas separation, and preparation method and use thereof |
Gongping Liu, Jiangying Liu, Wanqin Jin |
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| 11941572 |
Machine learning item delivery using sensor data |
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| 11935758 |
Atomic layer etching for subtractive metal etch |
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2024-03-19 |
