Issued Patents 2024
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12105422 | Photoresist development with halide chemistries | Samantha Tan, Jengyi Yu, Yiwen FAN, Yang Pan, Jeffrey Marks +5 more | 2024-10-01 |
| 12062538 | Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement | Jengyi Yu, Samantha Tan, Liu-Yang Yang, Chen-Wei Liang, Boris Volosskiy +4 more | 2024-08-13 |
| 12027375 | Selective etch using a sacrificial mask | Daniel Peter, Jengyi Yu, Alexander Kabansky, Katie Lynn Nardi, Samantha Tan +1 more | 2024-07-02 |
| 11988965 | Underlayer for photoresist adhesion and dose reduction | Samantha Tan, Jun Xue, Mary Anne Manumpil, Jengyi Yu | 2024-05-21 |