Issued Patents 2024
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12062537 | High etch selectivity, low stress ashable carbon hard mask | Jun Xue, Shih-Ked Lee, Samantha Tan | 2024-08-13 |
| 11988965 | Underlayer for photoresist adhesion and dose reduction | Samantha Tan, Jun Xue, Jengyi Yu, Da Li | 2024-05-21 |