Issued Patents 2023
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11852590 | Systems and methods for metrology with layer-specific illumination spectra | Daria Negri, Andrew V. Hill, Ohad Bachar, Vladimir Levinski, Yuri Paskover | 2023-12-26 |
| 11841621 | Moiré scatterometry overlay | Andrew V. Hill, Vladimir Levinski, Yuri Paskover | 2023-12-12 |
| 11815347 | Optical near-field metrology | Yuri Paskover, Vladimir Levinski | 2023-11-14 |
| 11800212 | Multi-directional overlay metrology using multiple illumination parameters and isolated imaging | Yonatan Vaknin, Andrew V. Hill | 2023-10-24 |
| 11784097 | Measurement of overlay error using device inspection system | Choon Hoong Hoo, Fangren Ji, Liran Yerushalmi, Antonio Mani, Allen Park +3 more | 2023-10-10 |
| 11726410 | Multi-resolution overlay metrology targets | Eitan Hajaj, Shlomo Eisenbach, Anna Golotsvan, Yoav Grauer, Eugene Maslovsky | 2023-08-15 |
| 11719533 | Modulation of scanning velocity during overlay metrology | David L. Brown, Andrew V. Hill | 2023-08-08 |
| 11713959 | Overlay metrology using spectroscopic phase | Andrei V. Shchegrov, Ido Dolev, Yoram Uziel | 2023-08-01 |
| 11709433 | Device-like metrology targets | Vladimir Levinski, Eran Amit, Nuriel Amir, Liran Yerushalmi, Amit Shaked | 2023-07-25 |
| 11644419 | Measurement of properties of patterned photoresist | Roie Volkovich, Liran Yerushalmi, Yoram Uziel | 2023-05-09 |
| 11615974 | Fab management with dynamic sampling plans, optimized wafer measurement paths and optimized wafer transport, using quantum computing | Tzahi Grunzweig, Einat Peled, Anna Golotsvan | 2023-03-28 |
| 11592755 | Enhancing performance of overlay metrology | Andrew V. Hill, Yonatan Vaknin, Yossi Simon, Daria Negri, Vladimir Levinski +9 more | 2023-02-28 |
| 11573497 | System and method for measuring misregistration of semiconductor device wafers utilizing induced topography | Daria Negri, Gilad Laredo | 2023-02-07 |
| 11556738 | System and method for determining target feature focus in image-based overlay metrology | Etay Lavert, Yossi Simon, Dimitry Sanko, Avner Safrani | 2023-01-17 |