Issued Patents 2022
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11495460 | Method for forming semiconductor structure by patterning resist layer having inorganic material | An-Ren Zi, Ching-Yu Chang | 2022-11-08 |
| 11437161 | Lithography apparatus and method for using the same | Chun-Lin Chang, Chieh Hsieh, Shang-Chieh Chien, Han-Lung Chang, Heng-Hsin Liu +1 more | 2022-09-06 |
| 11435817 | Multi-power management system and operation method thereof | Chien-Lee Liu, Tzu-Chiang Mi, Yi-Hsun Lin | 2022-09-06 |
| 11429027 | Photolithography method and apparatus | Shinn-Sheng Yu, Ru-Gun Liu, Hsu-Ting Huang | 2022-08-30 |
| 11422465 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Wei-Han Lai, Chien-Wei Wang | 2022-08-23 |
| 11411113 | FinFETs and methods of forming FinFETs | Tai-Chun Huang, Tien-I Bao | 2022-08-09 |
| 11387104 | Grafting design for pattern post-treatment in semiconductor manufacturing | Siao-Shan Wang, Ching-Yu Chang | 2022-07-12 |
| 11378884 | Extreme ultraviolet photoresist and method | Chen-Yu Liu, Ya-Ching Chang, Cheng-Han Wu, Ching-Yu Chang | 2022-07-05 |
| 11342193 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chih-Ming Lai, Wei-Liang Lin, Yung-Sung Yen, Ken-Hsien Hsieh | 2022-05-24 |
| 11320747 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Shinn-Sheng Yu, Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen +1 more | 2022-05-03 |
| 11307504 | Humidity control in EUV lithography | An-Ren Zi, Ching-Yu Chang, Joy Cheng | 2022-04-19 |
| 11300878 | Photoresist developer and method of developing photoresist | An-Ren Zi, Ching-Yu Chang, Joy Cheng | 2022-04-12 |
| 11295961 | Method of manufacturing a semiconductor device | Yen-Hao Chen, Wei-Han Lai, Ching-Yu Chang | 2022-04-05 |
| 11294286 | Pattern formation method using a photo mask for manufacturing a semiconductor device | Ru-Gun Liu, Cheng-I Huang, Chih-Ming Lai, Chien-Wen Lai, Ken-Hsien Hsieh +2 more | 2022-04-05 |
| 11289332 | Directional processing to remove a layer or a material formed over a substrate | Shih-Chun Huang, Chien-Wen Lai, Ru-Gun Liu, Wei-Liang Lin, Ya Hui Chang +3 more | 2022-03-29 |
| 11287740 | Photoresist composition and method of forming photoresist pattern | An-Ren Zi, Ching-Yu Chang | 2022-03-29 |
| 11281107 | Method for performing lithography process with post treatment | Ming-Hui Weng, Ching-Yu Chang | 2022-03-22 |
| 11276568 | Method for manufacturing a semiconductor device and a coating material | Yu Ling Chien, Chien-Chih Chen, Ching-Yu Chang, Yahru Cheng | 2022-03-15 |
| 11262659 | Method of cleaning extreme ultraviolet lithography collector | An-Ren Zi, Ching-Yu Chang | 2022-03-01 |
| 11239078 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2022-02-01 |
| 11215924 | Photoresist, developer, and method of forming photoresist pattern | An-Ren Zi, Ching-Yu Chang | 2022-01-04 |