Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11442364 | Materials and methods for forming resist bottom layer | Jing Hong Huang, Shang-Wern Chang, Ching-Yu Chang | 2022-09-13 |
| 11422465 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Wei-Han Lai, Chin-Hsiang Lin | 2022-08-23 |
| 11320738 | Pattern formation method and material for manufacturing semiconductor devices | Ching-Yu Chang, Shang-Wern Chang, Yen-Hao Chen | 2022-05-03 |