Issued Patents 2022
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11495460 | Method for forming semiconductor structure by patterning resist layer having inorganic material | An-Ren Zi, Chin-Hsiang Lin | 2022-11-08 |
| 11482411 | Semiconductor device and method | Jei-Ming Chen, Tze-Liang Lee | 2022-10-25 |
| 11476108 | Spin on carbon composition and method of manufacturing a semiconductor device | Jing Hong Huang, Wei-Han Lai | 2022-10-18 |
| 11460776 | Method and apparatus of patterning a semiconductor device | An-Ren Zi | 2022-10-04 |
| 11456170 | Cleaning solution and method of cleaning wafer | An-Ren Zi | 2022-09-27 |
| 11456266 | Bump structure and method of manufacturing bump structure | Ming-Da Cheng, Ming-Hui Weng | 2022-09-27 |
| 11442364 | Materials and methods for forming resist bottom layer | Jing Hong Huang, Chien-Wei Wang, Shang-Wern Chang | 2022-09-13 |
| 11387104 | Grafting design for pattern post-treatment in semiconductor manufacturing | Siao-Shan Wang, Chin-Hsiang Lin | 2022-07-12 |
| 11378884 | Extreme ultraviolet photoresist and method | Chen-Yu Liu, Ya-Ching Chang, Cheng-Han Wu, Chin-Hsiang Lin | 2022-07-05 |
| 11361943 | Adjustable fastening device for plasma gas injectors | Yung-Shun Hsu, Chiao-Kai Chang, Wai Hong Cheah, Chien-Fang Lin | 2022-06-14 |
| 11351509 | Filter with seal treatment | Kuan-Hsin Lo | 2022-06-07 |
| 11355318 | Adjustable fastening device for plasma gas injectors | Yung-Shun Hsu, Chiao-Kai Chang, Wai Hong Cheah, Chien-Fang Lin | 2022-06-07 |
| 11320738 | Pattern formation method and material for manufacturing semiconductor devices | Chien-Wei Wang, Shang-Wern Chang, Yen-Hao Chen | 2022-05-03 |
| 11307504 | Humidity control in EUV lithography | An-Ren Zi, Chin-Hsiang Lin, Joy Cheng | 2022-04-19 |
| 11300878 | Photoresist developer and method of developing photoresist | An-Ren Zi, Chin-Hsiang Lin, Joy Cheng | 2022-04-12 |
| 11295961 | Method of manufacturing a semiconductor device | Yen-Hao Chen, Wei-Han Lai, Chin-Hsiang Lin | 2022-04-05 |
| 11287740 | Photoresist composition and method of forming photoresist pattern | An-Ren Zi, Chin-Hsiang Lin | 2022-03-29 |
| 11281107 | Method for performing lithography process with post treatment | Ming-Hui Weng, Chin-Hsiang Lin | 2022-03-22 |
| 11276568 | Method for manufacturing a semiconductor device and a coating material | Yu Ling Chien, Chien-Chih Chen, Chin-Hsiang Lin, Yahru Cheng | 2022-03-15 |
| 11269256 | Underlayer material for photoresist | An-Ren Zi, Wei-Han Lai | 2022-03-08 |
| 11262659 | Method of cleaning extreme ultraviolet lithography collector | An-Ren Zi, Chin-Hsiang Lin | 2022-03-01 |
| 11226555 | Preparing patterned neutral layers and structures prepared using the same | Kuan-Hsin Lo | 2022-01-18 |
| 11215924 | Photoresist, developer, and method of forming photoresist pattern | An-Ren Zi, Chin-Hsiang Lin | 2022-01-04 |