Issued Patents 2022
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11495460 | Method for forming semiconductor structure by patterning resist layer having inorganic material | Chin-Hsiang Lin, Ching-Yu Chang | 2022-11-08 |
| 11460776 | Method and apparatus of patterning a semiconductor device | Ching-Yu Chang | 2022-10-04 |
| 11456170 | Cleaning solution and method of cleaning wafer | Ching-Yu Chang | 2022-09-27 |
| 11307504 | Humidity control in EUV lithography | Chin-Hsiang Lin, Ching-Yu Chang, Joy Cheng | 2022-04-19 |
| 11300878 | Photoresist developer and method of developing photoresist | Chin-Hsiang Lin, Ching-Yu Chang, Joy Cheng | 2022-04-12 |
| 11287740 | Photoresist composition and method of forming photoresist pattern | Chin-Hsiang Lin, Ching-Yu Chang | 2022-03-29 |
| 11269256 | Underlayer material for photoresist | Wei-Han Lai, Ching-Yu Chang | 2022-03-08 |
| 11262659 | Method of cleaning extreme ultraviolet lithography collector | Chin-Hsiang Lin, Ching-Yu Chang | 2022-03-01 |
| 11215924 | Photoresist, developer, and method of forming photoresist pattern | Ching-Yu Chang, Chin-Hsiang Lin | 2022-01-04 |