Issued Patents 2020
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10866090 | Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology | Tal Marciano, Nadav Gutman, Yuri Paskover, Guy M. Cohen | 2020-12-15 |
| 10824082 | Estimation of asymmetric aberrations | Yoel Feler | 2020-11-03 |
| 10824079 | Diffraction based overlay scatterometry | Yuval Lubashevsky, Yuri Paskover, Amnon Manassen | 2020-11-03 |
| 10761023 | Diffraction-based focus metrology | — | 2020-09-01 |
| 10754261 | Reticle optimization algorithms and optimal target design | Yoel Feler | 2020-08-25 |
| 10591406 | Symmetric target design in scatterometry overlay metrology | Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina +4 more | 2020-03-17 |
| 10579768 | Process compatibility improvement by fill factor modulation | Eitan Hajaj, Tal Itzkovich, Sharon Aharon, Michael Adel, Yuri Paskover +5 more | 2020-03-03 |
| 10565697 | Utilizing overlay misregistration error estimations in imaging overlay metrology | Tzahi Grunzweig, Nadav Gutman, David Gready, Mark Ghinovker, Claire E. Staniunas +2 more | 2020-02-18 |
| 10551749 | Metrology targets with supplementary structures in an intermediate layer | Amnon Manassen, Eran Amit, Nuriel Amir, Liran Yerushalmi, Amit Shaked | 2020-02-04 |
| 10527954 | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems | Daniel Kandel, Guy M. Cohen | 2020-01-07 |