Issued Patents 2020
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld +17 more | 2020-11-10 |
| 10824079 | Diffraction based overlay scatterometry | Yuval Lubashevsky, Yuri Paskover, Vladimir Levinski | 2020-11-03 |
| 10684563 | On the fly target acquisition | Andrew V. Hill, Nadav Gutman, Yossi Simon, Alexander Novikov, Eugene Maslovsky | 2020-06-16 |
| 10663281 | Systems and methods for optimizing focus for imaging-based overlay metrology | Andrew V. Hill | 2020-05-26 |
| 10579768 | Process compatibility improvement by fill factor modulation | Vladimir Levinski, Eitan Hajaj, Tal Itzkovich, Sharon Aharon, Michael Adel +5 more | 2020-03-03 |
| 10551749 | Metrology targets with supplementary structures in an intermediate layer | Vladimir Levinski, Eran Amit, Nuriel Amir, Liran Yerushalmi, Amit Shaked | 2020-02-04 |
| 10533940 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Andrew V. Hill, Daniel Kandel, Ilan Sela, Ohad Bachar, Barak Bringoltz | 2020-01-14 |