Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld, Zeng Zhao +17 more | 2020-11-10 |
| 10591406 | Symmetric target design in scatterometry overlay metrology | Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher +4 more | 2020-03-17 |
| 10533940 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Amnon Manassen, Andrew V. Hill, Daniel Kandel, Ilan Sela, Ohad Bachar | 2020-01-14 |