Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld +17 more | 2020-11-10 |
| 10677588 | Localized telecentricity and focus optimization for overlay metrology | Andrew V. Hill, Avi Abramov, Yuri Paskover, Dor Perry | 2020-06-09 |
| 10533940 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Amnon Manassen, Andrew V. Hill, Daniel Kandel, Ilan Sela, Barak Bringoltz | 2020-01-14 |