| 10831108 |
Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology |
Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld +17 more |
2020-11-10 |
| 10685165 |
Metrology using overlay and yield critical patterns |
Mark D. Smith, Mark Wagner, Eran Amit, Myungjun Lee |
2020-06-16 |
| 10591406 |
Symmetric target design in scatterometry overlay metrology |
Barak Bringoltz, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher +4 more |
2020-03-17 |
| 10571811 |
Device metrology targets and methods |
Eran Amit, Dror Alumot, Amit Shaked, Liran Yerushalmi |
2020-02-25 |
| 10533940 |
Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology |
Amnon Manassen, Andrew V. Hill, Ilan Sela, Ohad Bachar, Barak Bringoltz |
2020-01-14 |
| 10527954 |
Multi-layer overlay metrology target and complimentary overlay metrology measurement systems |
Vladimir Levinski, Guy M. Cohen |
2020-01-07 |