Issued Patents 2020
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld +17 more | 2020-11-10 |
| 10685165 | Metrology using overlay and yield critical patterns | Mark D. Smith, Mark Wagner, Eran Amit, Myungjun Lee | 2020-06-16 |
| 10591406 | Symmetric target design in scatterometry overlay metrology | Barak Bringoltz, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher +4 more | 2020-03-17 |
| 10571811 | Device metrology targets and methods | Eran Amit, Dror Alumot, Amit Shaked, Liran Yerushalmi | 2020-02-25 |
| 10533940 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Amnon Manassen, Andrew V. Hill, Ilan Sela, Ohad Bachar, Barak Bringoltz | 2020-01-14 |
| 10527954 | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems | Vladimir Levinski, Guy M. Cohen | 2020-01-07 |