Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10685165 | Metrology using overlay and yield critical patterns | Daniel Kandel, Mark Wagner, Eran Amit, Myungjun Lee | 2020-06-16 |
| 10579768 | Process compatibility improvement by fill factor modulation | Vladimir Levinski, Eitan Hajaj, Tal Itzkovich, Sharon Aharon, Michael Adel +5 more | 2020-03-03 |