| 10115568 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring |
Michael C. Kellogg, Alexei Marakhtanov, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi |
2018-10-30 |
| 10115564 |
Uniformity control circuit for use within an impedance matching circuit |
Alexei Marakhtanov, Felix Kozakevich, Kenneth Lucchesi |
2018-10-30 |
| 10083853 |
Electrostatic chuck design for cooling-gas light-up prevention |
Alexander Matyushkin, Alexei Marakhtanov, Keith Gaff, Felix Kozakevich |
2018-09-25 |
| 10049862 |
Chamber with vertical support stem for symmetric conductance and RF delivery |
Daniel Arthur Brown, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy +2 more |
2018-08-14 |
| 10026592 |
Systems and methods for tailoring ion energy distribution function by odd harmonic mixing |
Zhigang Chen, Alexei Marakhtanov |
2018-07-17 |
| 10002746 |
Multi regime plasma wafer processing to increase directionality of ions |
Alexei Marakhtanov, Lin Zhao, Felix Kozakevich, Kenneth Lucchesi, Zhigang Chen |
2018-06-19 |
| 9984859 |
Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes |
Alexei Marakhtanov, Felix Kozakevich, Brett Jacobs |
2018-05-29 |
| 9978565 |
Systems for cooling RF heated chamber components |
Jon McChesney, Saravanapriyan Sriraman, Ricky Marsh, Alex Paterson |
2018-05-22 |
| 9947557 |
Semiconductor processing system having multiple decoupled plasma sources |
Peter L. G. Ventzek, Harmeet Singh, Richard A. Gottscho |
2018-04-17 |
| 9883549 |
Substrate support assembly having rapid temperature control |
Alexander Matyushkin, Dan Katz, Theodoros Panagopoulos, Michael D. Willwerth |
2018-01-30 |
