Issued Patents 2018
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10146135 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Johannes Wangler, Manfred Maul, Damian Fiolka +1 more | 2018-12-04 |
| 10133183 | Optical component | Markus Deguenther, Paul Buettner, Willi Heintel, Henner Baitinger | 2018-11-20 |
| 10126658 | Illumination optical unit for EUV projection lithography | — | 2018-11-13 |
| 10061203 | Beam distributing optical device and associated unit, system and apparatus | Markus Deguenther, Thomas Korb | 2018-08-28 |
| 10018917 | Illumination optical unit for EUV projection lithography | Stig Bieling, Martin Endres, Markus Deguenther, Johannes Wangler | 2018-07-10 |
| 10007193 | Projection exposure apparatus and method for controlling a projection exposure apparatus | Markus Deguenther | 2018-06-26 |
| 9989766 | Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens | Hans-Juergen Dobschal, Karsten Lindig, Guenter Rudolph, Ersun Kartal, Lisa Riedel +1 more | 2018-06-05 |
| 9989767 | Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens | Hans-Juergen Dobschal, Karsten Lindig, Guenter Rudolph, Ersun Kartal, Lisa Riedel +1 more | 2018-06-05 |
| 9983483 | Illumination system of a microlithographic projection exposure apparatus | Stig Bieling, Markus Deguenther, Frank Schlesener, Markus Schwab | 2018-05-29 |
| 9977333 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Markus Deguenther, Michael Layh | 2018-05-22 |
| 9958783 | Illumination system for EUV projection lithography | Ralf Mueller | 2018-05-01 |
| 9933704 | Microlithography illumination optical system and microlithography projection exposure apparatus including same | Markus Deguenther, Michael Layh | 2018-04-03 |
| 9915874 | Illumination optical unit and illumination system for EUV projection lithography | — | 2018-03-13 |
| 9897925 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2018-02-20 |
| 9891530 | Illumination optical unit | Martin Endres | 2018-02-13 |
| 9880474 | System for producing structures in a substrate | — | 2018-01-30 |