Issued Patents 2018
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10146136 | Reflecting coating with optimized thickness | Hartmut Enkisch, Stig Bieling | 2018-12-04 |
| 10133182 | Illumination optical assembly for a projection exposure apparatus | Stig Bieling | 2018-11-20 |
| 10067424 | Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus | Toralf Gruner | 2018-09-04 |
| 10018917 | Illumination optical unit for EUV projection lithography | Stig Bieling, Markus Deguenther, Michael Patra, Johannes Wangler | 2018-07-10 |
| 9996010 | Illumination optical assembly for projection lithography | — | 2018-06-12 |
| 9996012 | Facet mirror for use in a projection exposure apparatus for microlithography | Udo Dinger, Armin Werber, Norbert Muehlberger, Florian Bach | 2018-06-12 |
| 9983484 | Illumination optical unit for EUV projection lithography | Ralf Mueller, Stig Bieling | 2018-05-29 |
| 9977335 | Illumination optical unit for projection lithography | — | 2018-05-22 |
| 9921484 | Illumination system and illumination optical unit for EUV projection lithography | — | 2018-03-20 |
| 9915875 | Illumination optical assembly for projection lithography | — | 2018-03-13 |
| 9897924 | Illumination optical unit for projection lithography | — | 2018-02-20 |
| 9897923 | Micromirror array | — | 2018-02-20 |
| 9891530 | Illumination optical unit | Michael Patra | 2018-02-13 |
| 9874819 | Mirror array | Stig Bieling, Markus Hauf, Lars Wischmeier, Fabian Haacker, Johannes Eisenmenger | 2018-01-23 |