MH

Markus Hauf

CG Carl Zeiss Smt Gmbh: 6 patents #11 of 287Top 4%
AB Asml Netherlands B.V.: 1 patents #194 of 559Top 35%
📍 Ulm, CA: #1 of 1 inventorsTop 100%
Overall (2018): #18,752 of 503,207Top 4%
6
Patents 2018

Issued Patents 2018

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
10162267 Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations Toralf Gruner, Sascha Bleidistel, Alexander Wolf, Joachim Hartjes, Markus Schwab 2018-12-25
10108097 Arrangement for manipulating the position of an element Ulrich Schoenhoff, Eylem Bektas 2018-10-23
10101507 Mirror device Yanko Sarov, Markus Holz, Fabian Haacker, Mark Christof Wengler 2018-10-16
10031423 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2018-07-24
9887613 Lithography device with eddy-current brake Alexander Vogler 2018-02-06
9874819 Mirror array Stig Bieling, Lars Wischmeier, Fabian Haacker, Martin Endres, Johannes Eisenmenger 2018-01-23