Issued Patents 2017
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9805941 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2017-10-31 |
| 9793110 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Hu Kang, Shankar Swaminathan, Jun Qian, Wanki Kim, Bart J. van Schravendijk +1 more | 2017-10-17 |
| 9778561 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Adrien LaVoie, Thomas Knisley +3 more | 2017-10-03 |
| 9670579 | Method for depositing a chlorine-free conformal SiN film | Jon Henri, Bart van Schravendijk, Easwar Srinivasan | 2017-06-06 |
| 9601693 | Method for encapsulating a chalcogenide material | Jon Henri, Seshasayee Varadarajan, Bhadri N. Varadarajan | 2017-03-21 |
| 9589790 | Method of depositing ammonia free and chlorine free conformal silicon nitride film | Jon Henri, Shane Tang, James S. Sims | 2017-03-07 |
| 9576811 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2017-02-21 |
| 9570274 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Jon Henri, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan +3 more | 2017-02-14 |
| 9564312 | Selective inhibition in atomic layer deposition of silicon-containing films | Jon Henri, Bart J. van Schravendijk, Shane Tang, Karl Leeser | 2017-02-07 |
| 9548188 | Method of conditioning vacuum chamber of semiconductor substrate processing apparatus | — | 2017-01-17 |