Issued Patents 2017
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9852901 | Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges | Sesha Varadarajan, Shankar Swaminathan, Saangrut Sangplung, Frank L. Pasquale, Ted Minshall +2 more | 2017-12-26 |
| 9840776 | Multi-station plasma reactor with RF balancing | Sunil Kapoor, Karl Leeser, Yaswanth Rangineni | 2017-12-12 |
| 9824941 | Systems and methods for detection of plasma instability by electrical measurement | Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Ramesh Chandrasekharan, Edward Augustyniak +1 more | 2017-11-21 |
| 9797042 | Single ALD cycle thickness control in multi-station substrate deposition systems | Romuald Nowak, Hu Kang, Jun Qian | 2017-10-24 |
| 9793110 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Hu Kang, Shankar Swaminathan, Jun Qian, Wanki Kim, Dennis M. Hausmann +1 more | 2017-10-17 |
| 9793096 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni, Frank L. Pasquale +8 more | 2017-10-17 |
| 9786570 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Jon Henri | 2017-10-10 |
| 9778561 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Dennis M. Hausmann, Thomas Knisley +3 more | 2017-10-03 |
| 9745658 | Chamber undercoat preparation method for low temperature ALD films | Hu Kang, Jun Qian | 2017-08-29 |
| 9738977 | Showerhead curtain gas method and system for film profile modulation | Ishtak Karim | 2017-08-22 |
| 9738972 | Tandem source activation for CVD of films | Hu Kang, Karl Leeser | 2017-08-22 |
| 9685320 | Methods for depositing silicon oxide | Hu Kang, Wanki Kim | 2017-06-20 |
| 9673041 | Plasma assisted atomic layer deposition titanium oxide for patterning applications | Shankar Swaminathan, Frank L. Pasquale | 2017-06-06 |
| 9644271 | Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication | Douglas Keil, Ishtak Karim, Yaswanth Rangineni, Yukinori Sakiyama, Edward Augustyniak +2 more | 2017-05-09 |
| 9631276 | Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition | Ramesh Chandrasekharan, Jennifer O'Loughlin, Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale +1 more | 2017-04-25 |
| 9624578 | Method for RF compensation in plasma assisted atomic layer deposition | Jun Qian, Frank L. Pasquale, Chloe Baldasseroni, Hu Kang, Shankar Swaminathan +7 more | 2017-04-18 |
| 9617638 | Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system | Hu Kang, Purushottam Kumar, Shankar Swaminathan, Jun Qian, Frank L. Pasquale +1 more | 2017-04-11 |
| 9611544 | Plasma activated conformal dielectric film deposition | Mandyam Sriram | 2017-04-04 |
| 9570290 | Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications | Shankar Swaminathan, Frank L. Pasquale | 2017-02-14 |
| 9552982 | Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants | — | 2017-01-24 |