| 9840776 |
Multi-station plasma reactor with RF balancing |
Sunil Kapoor, Adrien LaVoie, Yaswanth Rangineni |
2017-12-12 |
| 9793096 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity |
Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more |
2017-10-17 |
| 9758868 |
Plasma suppression behind a showerhead through the use of increased pressure |
Patrick Breiling, Ramesh Chandrasekharan, Edmund Minshall, Colin F. Smith, Andrew Duvall |
2017-09-12 |
| 9738972 |
Tandem source activation for CVD of films |
Adrien LaVoie, Hu Kang |
2017-08-22 |
| 9704692 |
System for instantaneous radiofrequency power measurement and associated methods |
— |
2017-07-11 |
| 9644271 |
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication |
Douglas Keil, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Yukinori Sakiyama +2 more |
2017-05-09 |
| 9598770 |
Contoured showerhead for improved plasma shaping and control |
James S. Sims |
2017-03-21 |
| 9596744 |
Radio frequency generator having multiple mutually exclusive oscillators for use in plasma processing |
— |
2017-03-14 |
| 9564312 |
Selective inhibition in atomic layer deposition of silicon-containing films |
Jon Henri, Dennis M. Hausmann, Bart J. van Schravendijk, Shane Tang |
2017-02-07 |
