Issued Patents 2017
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9824884 | Method for depositing metals free ald silicon nitride films using halide-based precursors | James S. Sims, Ramesh Chandrasekharan, Andrew John McKerrow, Seshasayee Varadarajan, Kathryn M. Kelchner | 2017-11-21 |
| 9786570 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Adrien LaVoie | 2017-10-10 |
| 9670579 | Method for depositing a chlorine-free conformal SiN film | Dennis M. Hausmann, Bart van Schravendijk, Easwar Srinivasan | 2017-06-06 |
| 9601693 | Method for encapsulating a chalcogenide material | Dennis M. Hausmann, Seshasayee Varadarajan, Bhadri N. Varadarajan | 2017-03-21 |
| 9589790 | Method of depositing ammonia free and chlorine free conformal silicon nitride film | Dennis M. Hausmann, Shane Tang, James S. Sims | 2017-03-07 |
| 9570274 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan +3 more | 2017-02-14 |
| 9564312 | Selective inhibition in atomic layer deposition of silicon-containing films | Dennis M. Hausmann, Bart J. van Schravendijk, Shane Tang, Karl Leeser | 2017-02-07 |