Issued Patents 2017
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9797042 | Single ALD cycle thickness control in multi-station substrate deposition systems | Romuald Nowak, Adrien LaVoie, Jun Qian | 2017-10-24 |
| 9793110 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Shankar Swaminathan, Jun Qian, Wanki Kim, Dennis M. Hausmann, Bart J. van Schravendijk +1 more | 2017-10-17 |
| 9793096 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni, Frank L. Pasquale +8 more | 2017-10-17 |
| 9786570 | Methods for depositing films on sensitive substrates | Shankar Swaminathan, Adrien LaVoie, Jon Henri | 2017-10-10 |
| 9745658 | Chamber undercoat preparation method for low temperature ALD films | Jun Qian, Adrien LaVoie | 2017-08-29 |
| 9738972 | Tandem source activation for CVD of films | Adrien LaVoie, Karl Leeser | 2017-08-22 |
| 9685320 | Methods for depositing silicon oxide | Wanki Kim, Adrien LaVoie | 2017-06-20 |
| 9624578 | Method for RF compensation in plasma assisted atomic layer deposition | Jun Qian, Frank L. Pasquale, Adrien LaVoie, Chloe Baldasseroni, Shankar Swaminathan +7 more | 2017-04-18 |
| 9617638 | Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system | Adrien LaVoie, Purushottam Kumar, Shankar Swaminathan, Jun Qian, Frank L. Pasquale +1 more | 2017-04-11 |