Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9589790 | Method of depositing ammonia free and chlorine free conformal silicon nitride film | Jon Henri, Dennis M. Hausmann, James S. Sims | 2017-03-07 |
| 9564312 | Selective inhibition in atomic layer deposition of silicon-containing films | Jon Henri, Dennis M. Hausmann, Bart J. van Schravendijk, Karl Leeser | 2017-02-07 |