Issued Patents 2017
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9627373 | CMOS compatible fuse or resistor using self-aligned contacts | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2017-04-18 |
| 9627377 | Self-aligned dielectric isolation for FinFET devices | Marc A. Bergendahl, Kangguo Cheng, David V. Horak, Ali Khakifirooz, Shom Ponoth +4 more | 2017-04-18 |
| 9613869 | FinFET devices | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2017-04-04 |
| 9607943 | Capacitors | Veeraraghavan S. Basker, Kangguo Cheng, Christopher J. Penny, Junli Wang | 2017-03-28 |
| 9601378 | Semiconductor fins for FinFET devices and sidewall image transfer (SIT) processes for manufacturing the same | Veeraraghavan S. Basker, Kangguo Cheng | 2017-03-21 |
| 9595578 | Undercut insulating regions for silicon-on-insulator device | Kangguo Cheng, Bruce B. Doris, Balasubramanian Pranatharthiharan, Shom Ponoth, Tenko Yamashita | 2017-03-14 |
| 9576980 | FinFET devices having gate dielectric structures with different thicknesses on same semiconductor structure | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2017-02-21 |
| 9576852 | Integrated circuits with self aligned contacts and methods of manufacturing the same | Ming He, Seowoo Nam, Yann Mignot, Jim Kelly, Raghuveer Patlotta | 2017-02-21 |
| 9576096 | Semiconductor structures including an integrated finFET with deep trench capacitor and methods of manufacture | Kevin K. Chan, Sivananda K. Kanakasabapathy, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung +1 more | 2017-02-21 |
| 9570591 | Forming semiconductor device with close ground rules | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2017-02-14 |
| 9570571 | Gate stack integrated metal resistors | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2017-02-14 |
| 9564437 | Method and structure for forming FinFET CMOS with dual doped STI regions | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2017-02-07 |
| 9559009 | Gate structure cut after formation of epitaxial active regions | Xiuyu Cai, Kangguo Cheng, Johnathan E. Faltermeier, Ali Khakifirooz, Ruilong Xie | 2017-01-31 |
| 9559014 | Self-aligned punch through stopper liner for bulk FinFET | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2017-01-31 |
| 9558991 | Formation of isolation surrounding well implantation | Kangguo Cheng, Shom Ponoth, Tenko Yamashita | 2017-01-31 |
| 9553088 | Forming semiconductor device with close ground rules | Veeraraghavan S. Basker, Kangguo Cheng, Junli Wang | 2017-01-24 |
| 9548243 | Self aligned via and pillar cut for at least a self aligned double pitch | Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Terry A. Spooner | 2017-01-17 |