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Dummy gate structure for electrical isolation of a fin DRAM |
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Ricardo A. Donaton, Xinhui Wang, Deepal Wehella-Gamage |
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Semiconductor structures including an integrated finFET with deep trench capacitor and methods of manufacture |
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Integrated fin and strap structure for an access transistor of a trench capacitor |
Kevin K. Chan, Dae-Gyu Park, Xinhui Wang |
2017-02-21 |
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Vertically integrated memory cell |
John E. Barth, Jr. |
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| 9564445 |
Dummy gate structure for electrical isolation of a fin DRAM |
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Method of forming integrated fin and strap structure for an access transistor of a trench capacitor |
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2017-02-07 |
