Issued Patents 2017
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9824889 | CVD silicon monolayer formation method and gate oxide ALD formation on III-V materials | Andrew C. Kummel, Mary Edmonds, Mei Chang | 2017-11-21 |
| 9773663 | Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD | Naomi Yoshida, Mei Chang, Mary Edmonds, Andrew C. Kummel, Sang Wook Park +1 more | 2017-09-26 |
| 9768013 | Apparatus and method for selective deposition | Abhishek Dube, Schubert S. Chu, David Thompson, Jeffrey W. Anthis | 2017-09-19 |
| 9711366 | Selective etch for metal-containing materials | Nitin K. Ingle, Lin Xu, Soonam Park, Xikun Wang, Jeffrey W. Anthis | 2017-07-18 |
| 9691848 | Semiconductor devices with germanium-rich active layers and doped transition layers | Willy Rachmady, Van H. Le, Ravi Pillarisetty, Marc C. French, Aaron A. Budrevich | 2017-06-27 |
| 9685325 | Carbon and/or nitrogen incorporation in silicon based films using silicon precursors with organic co-reactants by PE-ALD | Mark Saly, David Thompson | 2017-06-20 |
| 9640671 | Deep gate-all-around semiconductor device having germanium or group III-V active layer | Ravi Pillarisetty, Willy Rachmady, Van H. Le, Seung Hoon Sung, Jack T. Kavalieros +5 more | 2017-05-02 |