Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9824889 | CVD silicon monolayer formation method and gate oxide ALD formation on III-V materials | Andrew C. Kummel, Mei Chang, Jessica S. Kachian | 2017-11-21 |
| 9773663 | Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD | Jessica S. Kachian, Naomi Yoshida, Mei Chang, Andrew C. Kummel, Sang Wook Park +1 more | 2017-09-26 |
| 9607920 | Self-limiting chemical vapor deposition and atomic layer deposition methods | Andrew C. Kummel, Atif Noori | 2017-03-28 |