Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9833029 | Method of forming three-dimensional electronic mannequin | Li-Ching Chang | 2017-12-05 |
| 9824889 | CVD silicon monolayer formation method and gate oxide ALD formation on III-V materials | Andrew C. Kummel, Mary Edmonds, Jessica S. Kachian | 2017-11-21 |
| 9653318 | Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition | David T. Or, Joshua Collins | 2017-05-16 |
| 9601339 | Methods for depositing fluorine/carbon-free conformal tungsten | Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, David Thompson +1 more | 2017-03-21 |
| 9595466 | Methods for etching via atomic layer deposition (ALD) cycles | Xinyu Fu, Srinivas Gandikota, Seshadri Ganguli, Guoqiang Jian, Yixiong Yang +2 more | 2017-03-14 |
| 9552968 | Plasma cleaning apparatus and method | Martin Deehan, Matt Cheng-Hsiung Tsai, Nan Lu, David T. Or | 2017-01-24 |