Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9653318 | Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition | Joshua Collins, Mei Chang | 2017-05-16 |
| 9552968 | Plasma cleaning apparatus and method | Martin Deehan, Matt Cheng-Hsiung Tsai, Nan Lu, Mei Chang | 2017-01-24 |