Issued Patents 2016
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9515141 | FinFET device with channel strain | Bruce B. Doris, Hong He, Gauri Karve, Fee Li Lie | 2016-12-06 |
| 9515089 | Bulk fin formation with vertical fin sidewall profile | Kangguo Cheng, Hong He, Chiahsun Tseng, Yunpeng Yin | 2016-12-06 |
| 9502411 | Strained finFET device fabrication | Bruce B. Doris, Hong He, Gauri Karve, Fee Li Lie, Stuart A. Sieg | 2016-11-22 |
| 9472415 | Directional chemical oxide etch technique | Emre Alptekin, Ahmet S. Ozcan, Viraj Y. Sardesai, Cung D. Tran | 2016-10-18 |
| 9472447 | Confined eptaxial growth for continued pitch scaling | Balasubramanian Pranatharthiharan | 2016-10-18 |
| 9472506 | Registration mark formation during sidewall image transfer process | David J. Conklin, Allen H. Gabor, Byeong Y. Kim, Fee Li Lie, Stuart A. Sieg | 2016-10-18 |
| 9431399 | Method for forming merged contact for semiconductor device | Emre Alptekin, Balasubramanian Pranatharthiharan, Ravikumar Ramachandran, Mickey H. Yu | 2016-08-30 |
| 9331148 | FinFET device with channel strain | Bruce B. Doris, Hong He, Gauri Karve, Fee Li Lie | 2016-05-03 |
| 9312136 | Replacement metal gate stack for diffusion prevention | Takashi Ando, Johnathan E. Faltermeier, Su Chen Fan, Injo Ok, Tenko Yamashita | 2016-04-12 |
| 9305845 | Self-aligned quadruple patterning process | Matthew E. Colburn, Fee Li Lie, Stuart A. Sieg | 2016-04-05 |
| 9299705 | Method of forming semiconductor fins and insulating fence fins on a same substrate | — | 2016-03-29 |
| 9287135 | Sidewall image transfer process for fin patterning | Bruce B. Doris, Hong He, Alexander Reznicek | 2016-03-15 |