Issued Patents 2016
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9515164 | Methods and structure to form high K metal gate stack with single work-function metal | Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Shahab Siddiqui | 2016-12-06 |
| 9496306 | Solid-state imaging device, method for manufacturing the same, and imaging apparatus | Tetsuji Yamaguchi, Yuko Ohgishi, Harumi Ikeda | 2016-11-15 |
| 9496263 | Stacked strained and strain-relaxed hexagonal nanowires | Pouya Hashemi, John A. Ott, Alexander Reznicek | 2016-11-15 |
| 9496183 | Selective thickening of pFET dielectric | Hemanth Jagannathan, Barry P. Linder | 2016-11-15 |
| 9484427 | Field effect transistors having multiple effective work functions | Min Dai, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon | 2016-11-01 |
| 9484438 | Method to improve reliability of replacement gate device | Eduard A. Cartier, Kisik Choi, Vijay Narayanan | 2016-11-01 |
| 9484412 | Strained silicon—germanium integrated circuit with inversion capacitance enhancement and method to fabricate same | Pouya Hashemi, Pranita Kerber, Alexander Reznicek | 2016-11-01 |
| 9472419 | Method of patterning dopant films in high-K dielectrics in a soft mask integration scheme | Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2016-10-18 |
| 9472643 | Method to improve reliability of replacement gate device | Eduard A. Cartier, Kisik Choi, Vijay Narayanan | 2016-10-18 |
| 9472553 | High-K gate dielectric and metal gate conductor stack for planar field effect transistors formed on type III-V semiconductor material and silicon germanium semiconductor material | Martin M. Frank, Pranita Kerber, Vijay Narayanan | 2016-10-18 |
| 9472408 | Nitridation on HDP oxide before high-k deposition to prevent oxygen ingress | Veeraraghavan S. Basker, Johnathan E. Faltermeier, Hemanth Jagannathan, Tenko Yamashita | 2016-10-18 |
| 9466492 | Method of lateral oxidation of NFET and PFET high-K gate stacks | Robert H. Dennard, Martin M. Frank | 2016-10-11 |
| 9466692 | Method to improve reliability of replacement gate device | Eduard A. Cartier, Kisik Choi, Vijay Narayanan | 2016-10-11 |
| 9455203 | Low threshold voltage CMOS device | Changhwan Choi, Kisik Choi, Vijay Narayanan | 2016-09-27 |
| 9449887 | Method of forming replacement gate PFET having TiALCO layer for improved NBTI performance | Balaji Kannan, Vijay Narayanan | 2016-09-20 |
| 9443953 | Sacrificial silicon germanium channel for inversion oxide thickness scaling with mitigated work function roll-off and improved negative bias temperature instability | Eduard A. Cartier, Kevin K. Chan, Vijay Narayanan | 2016-09-13 |
| 9425279 | Semiconductor device including high-K metal gate having reduced threshold voltage variation | David J. Frank | 2016-08-23 |
| 9412596 | Nitridation on HDP oxide before high-k deposition to prevent oxygen ingress | Veeraraghavan S. Basker, Johnathan E. Faltermeier, Hemanth Jagannathan, Tenko Yamashita | 2016-08-09 |
| 9391164 | Method to improve reliability of replacement gate device | Eduard A. Cartier, Kisik Choi, Vijay Narayanan | 2016-07-12 |
| 9382069 | Fixing device and image forming apparatus | — | 2016-07-05 |
| 9373501 | Hydroxyl group termination for nucleation of a dielectric metallic oxide | Michael P. Chudzik, Min Dai, Martin M. Frank, David F. Hilscher, Rishikesh Krishnan +3 more | 2016-06-21 |
| 9368536 | Solid state imaging device for reducing dark current, method of manufacturing the same, and imaging apparatus | Itaru Oshiyama, Susumu Hiyama, Tetsuji Yamaguchi, Yuko Ohgishi, Harumi Ikeda | 2016-06-14 |
| 9362282 | High-K gate dielectric and metal gate conductor stack for planar field effect transistors formed on type III-V semiconductor material and silicon germanium semiconductor material | Martin M. Frank, Pranita Kerber, Vijay Narayanan | 2016-06-07 |
| 9349832 | Sacrificial silicon germanium channel for inversion oxide thickness scaling with mitigated work function roll-off and improved negative bias temperature instability | Eduard A. Cartier, Kevin K. Chan, Vijay Narayanan | 2016-05-24 |
| 9330938 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2016-05-03 |