Issued Patents 2016
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9515164 | Methods and structure to form high K metal gate stack with single work-function metal | Takashi Ando, Siddarth A. Krishnan, Unoh Kwon, Shahab Siddiqui | 2016-12-06 |
| 9484427 | Field effect transistors having multiple effective work functions | Takashi Ando, Min Dai, Siddarth A. Krishnan, Unoh Kwon | 2016-11-01 |
| 9472419 | Method of patterning dopant films in high-K dielectrics in a soft mask integration scheme | Takashi Ando, Hemanth Jagannathan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2016-10-18 |
| 9449887 | Method of forming replacement gate PFET having TiALCO layer for improved NBTI performance | Takashi Ando, Vijay Narayanan | 2016-09-20 |
| 9418995 | Method and structure for transistors using gate stack dopants with minimal nitrogen penetration | Unoh Kwon, Rekha Rajaram | 2016-08-16 |
| 9330938 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Takashi Ando, Hemanth Jagannathan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2016-05-03 |